Ms. Yoshiaki Ogiso Profile

Yoshiaki Ogiso

at Advantest Corp

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Publications (6)

Proceedings Article | 5 October 2023 Paper

High-performance computing architecture (HW/SW) for mask CDSEM design based metrology

Tatsuro Okawa, Yusuke Kakinuma, Yoshiaki Ogiso, Naoyuki Tanaka, Kazuo Mukawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai

Proceedings Volume 12802, 128020D (2023) https://doi.org/10.1117/12.2675545

KEYWORDS: Image processing, Metrology, Design and modelling, Computer hardware, Image processing software, Scanning electron microscopy, Contour extraction, Parallel processing, Computing systems, Lithography

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Proceedings Article | 10 May 2016 Paper

The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information

Won Joo Park, Hyung-Joo Lee, Yoon Taek Han, Seuk Hwan Choi, Hak Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Yoshiaki Ogiso, Soichi Shida, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 9984, 998407 (2016) https://doi.org/10.1117/12.2242496

KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Metrology, Image processing, Statistical analysis, Image quality, Neodymium, Semiconductors, Optical proximity correction

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Proceedings Article | 28 July 2014 Paper

Novel CD-SEM measurement methodology for complex OPCed patterns

Hyung-Joo Lee, Won Joo Park, Seuk Hwan Choi, Dong Hoon Chung, Inkyun Shin, Byung-Gook Kim, Chan-Uk Jeon, Hiroshi Fukaya, Yoshiaki Ogiso, Soichi Shida, Takayuki Nakamura

Proceedings Volume 9256, 92560D (2014) https://doi.org/10.1117/12.2069368

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Metrology, Semiconductors, Error analysis, Optical proximity correction, Reliability, Tolerancing, Lithography

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Proceedings Article | 27 May 2010 Paper

The large contour data generation from divided image of photomask pattern of 32 nm and beyond

Tsutomu Murakawa, Yoshiaki Ogiso, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7748, 77481A (2010) https://doi.org/10.1117/12.866056

KEYWORDS: Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Data acquisition, Data conversion, Imaging arrays, Data modeling, Algorithm development, Distortion

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Proceedings Article | 23 September 2009 Paper

A study of contour image comparison measurement for photomask patterns of 32 nm and beyond

Isao Yonekura, Hidemitsu Hakii, Keishi Tanaka, Masaru Higuchi, Yoshiaki Ogiso, Toshihide Oba, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7488, 748831 (2009) https://doi.org/10.1117/12.833405

KEYWORDS: Photomasks, Distance measurement, Scanning electron microscopy, Cadmium, Critical dimension metrology, Image enhancement, Printing, Semiconducting wafers, Reticles, Software development

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Proceedings Article | 20 October 2006 Paper

A new algorithm for SEM critical dimension measurements for differentiating between lines and spaces in dense line/space patterns without tone dependence

J. Matsumoto, Y. Ogiso, M. Sekine, T. Iwai, J. Whittey

Proceedings Volume 6349, 634941 (2006) https://doi.org/10.1117/12.686143

KEYWORDS: Scanning electron microscopy, Optical alignment, Detection and tracking algorithms, Critical dimension metrology, Photomasks, Pattern recognition, Algorithm development, Reflectivity, Beam shaping, Optical simulations

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Showing 5 of 6 publications

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