Dr. Yoshihiro Shiode Profile

Dr. Yoshihiro Shiode

Senior Engineer at Canon Inc

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Author

Publications (9)

Proceedings Article | 30 April 2023 Presentation

Refinements of a nanoimprint process simulator

Shingo Ishida, Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Shintaro Narioka, Yoshihiro Shiode, Sentaro Aihara, Toshiya Asano

Proceedings Volume 12495, 124950N (2023) https://doi.org/10.1117/12.2657058

KEYWORDS: Nanoimprint lithography, Optical lithography, Ultraviolet radiation, Physics, Performance modeling, Nanotechnology, Manufacturing equipment, Manufacturing, Lithography, Device simulation

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SPIE Journal Paper | 4 January 2022

Enabling nanoimprint simulator for quality verification: process-design co-optimization toward high-volume manufacturing

Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Shintaro Narioka, Takahiro Nakayama, Yoshihiro Shiode, Sentaro Aihara, Toshiya Asano

JM3, Vol. 21, Issue 01, 011005, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011005

KEYWORDS: Nanoimprint lithography, Photoresist processing, Computer simulations, Distortion, Manufacturing, Head, Solids, Optical lithography, High volume manufacturing, Resistance

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Proceedings Article | 23 March 2020 Paper

Enabling nanoimprint simulator for quality verification; process-design co-optimization toward high volume manufacturing

Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Shintaro Narioka, Takahiro Nakayama, Yoshihiro Shiode, Sentaro Aihara, Toshiya Asano

Proceedings Volume 11328, 113280N (2020) https://doi.org/10.1117/12.2551999

KEYWORDS: Nanoimprint lithography, Computer simulations, Photoresist processing, Manufacturing, Distortion, High volume manufacturing, Solids, Overlay metrology, Fluid dynamics

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Proceedings Article | 20 March 2006 Paper

Study of polarization aberration measurement using SPIN method

Yoshihiro Shiode, Takeaki Ebiahara

Proceedings Volume 6154, 615431 (2006) https://doi.org/10.1117/12.656137

KEYWORDS: Polarization, Birefringence, Metrology, Error analysis, Image analysis, Monochromatic aberrations, Resolution enhancement technologies, Device simulation, Calibration, Wavefront aberrations

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Proceedings Article | 15 March 2006 Paper

A new on-machine measurement system to measure wavefront aberrations of projection optics with hyper-NA

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, Y. Shiode

Proceedings Volume 6154, 615424 (2006) https://doi.org/10.1117/12.657865

KEYWORDS: Projection systems, Wavefront aberrations, Fiber optic illuminators, Semiconducting wafers, Interferometers, Spatial coherence, Charge-coupled devices, Reticles, Light sources, Diffraction

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Proceedings Article | 12 May 2005 Paper

A novel focus monitoring method using double side chrome mask

Yoshihiro Shiode, Hiroshi Morohoshi, Atsushi Takagi, Kohei Fujimaru, Kazushi Mizumoto, Yuki Takahashi

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600170

KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Error analysis, Monochromatic aberrations, Critical dimension metrology, Diffraction, Laser induced plasma spectroscopy, Inspection, Double patterning technology

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Proceedings Article | 12 May 2005 Paper

Characterization of imaging performance: considering both illumination intensity profile and lens aberration

Takeaki Ebihara, Hideyuki Saito, Takafumi Miyaharu, Shuichi Okada, Yoshihiro Shiode, Takahisa Shiozawa, Toshiyuki Yoshihara

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600481

KEYWORDS: Scanning electron microscopy, Inspection, Metrology, Light sources, Monochromatic aberrations, Photomasks, Reticles, Error analysis, Optical testing, CCD cameras

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Proceedings Article | 26 June 2003 Paper

0.85-NA ArF exposure system and performance

Tsuneo Kanda, Yoshihiro Shiode, Ken-ichiro Shinoda

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485464

KEYWORDS: Wavefronts, Metrology, Lithography, Lithographic illumination, Photomasks, Optical lithography, Monochromatic aberrations, Semiconducting wafers, Scanning electron microscopy, Silicon

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Proceedings Article | 30 July 2002 Paper

Method of Zernike coefficients extraction for optics aberration measurement

Yoshihiro Shiode, Shuuichi Okada, Hiroki Takamori, Hideki Matsuda, Sachiko Fujiwara

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474530

KEYWORDS: Scanning electron microscopy, Monochromatic aberrations, Light sources, Zernike polynomials, Error analysis, Optical testing, Wavefronts, Photomasks, Overlay metrology, Semiconducting wafers

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Showing 5 of 9 publications

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