Prof. Yoshihiro Todokoro Profile

Prof. Yoshihiro Todokoro

Professor at Nara Institute of Science and Technology

SPIE Involvement:

Author

Proceedings Article | 1 September 1998 Paper

Enhanced lithography CoO model: considerations for advanced mask

Yoshihiro Todokoro, Yoshihiro Oda

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328798

KEYWORDS: Reticles, Photomasks, Lithography, Optical lithography, Semiconducting wafers, Electron beam lithography, X-rays, X-ray lithography, Manufacturing, X-ray optics

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Proceedings Article | 8 December 1995 Paper

Next-generation mask strategy: accuracy and mask-size survey and discussion results at PMJ '95 rump session

Yoshihiro Todokoro, Hiroaki Morimoto

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228173

KEYWORDS: Photomasks, Lithography, Mask making, Etching, Photoresist processing, Optical lithography, Error analysis, Electron beam lithography, Electronics, Printing

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Proceedings Article | 7 December 1994 Paper

Design optimization of optical proximity correction mask for device manufacturing

Emiko Sugiura, Hisashi Watanabe, Tadashi Imoriya, Yoshihiro Todokoro

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195820

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Inspection, Mask making, Reticles, Lithium, Optics manufacturing, Defect detection, Manufacturing

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Proceedings Article | 3 November 1994 Paper

Fabrication and pattern transfer of optical proximity correction (OPC) mask

Emiko Sugiura, Hisashi Watanabe, Tadashi Imoriya, Yoshihiro Todokoro

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191929

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Computer programming, X-ray technology, Reticles, Defect inspection, Defect detection, Mask making, Lithography

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Proceedings Article | 17 May 1994 Paper

Application of CVD antireflective-layer process for sub-half-micrometer devices

Hideaki Mito, Yoshiyuki Tani, Yoshimitsu Okuda, Yoshihiro Todokoro, Toshiaki Tatsuta, Mikio Sawai, Osamu Tsujii

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175472

KEYWORDS: Excimer lasers, Aluminum, Lithography, Reflectivity, Silicon, Etching, Tin, Dry etching, Chemical vapor deposition, Oxides

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Proceedings Article | 8 August 1993 Paper

Application of phase-shifting mask to DRAM cell capacitor fabrication

Emiko Sugiura, Hisashi Watanabe, Takashi Saito, Tadashi Imoriya, Yoshihiro Todokoro, Morio Inoue

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150490

KEYWORDS: Capacitors, Photomasks, Phase shifts, Semiconducting wafers, Lithography, Capacitance, Mask making, Silicon, Optical lithography, Very large scale integration

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Proceedings Article | 4 August 1993 Paper

Survey on pattern dimension measurement

Toshio Kaneko, Yoshihiro Todokoro

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.148956

KEYWORDS: Semiconducting wafers, Photomasks, Wafer-level optics, Calibration, Metrology, Standards development, Humidity, Scanning electron microscopy, Semiconductors, Inspection equipment

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Proceedings Article | 1 February 1992 Paper

Wafer charging in different types of plasma etchers

Takashi Namura, Hirofumi Uchida, Hiroyuki Okada, Atsushi Koshio, Satoshi Nakagawa, Yoshihiro Todokoro, Morio Inoue

Proceedings Volume 1593, (1992) https://doi.org/10.1117/12.56911

KEYWORDS: Plasma, Semiconducting wafers, Electrodes, Magnetism, Etching, Reactive ion etching, Oxides, Ions, Dry etching, Plasma etching

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Proceedings Article | 1 July 1991 Paper

Transparent phase-shifting mask with multistage phase shifter and comb-shaped shifter

Hisashi Watanabe, Yoshihiro Todokoro, Yoshihiko Hirai, Morio Inoue

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44832

KEYWORDS: Photomasks, Phase shifting, Phase shifts, Optical lithography, Very large scale integration, Chromium, Polymethylmethacrylate, Semiconducting wafers, Opacity, Polymers

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Showing 5 of 9 publications

Conference Committee Involvement (3)

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

Photomask and NGL Mask Technology X

16 April 2003 | Yokohama, Japan

Symposium on Photomask and X-Ray Mask Technology

18 April 1996 | Kawasaki City, Japan

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