Mr. Yoshitake Tsuji Profile

Yoshitake Tsuji

Chief Engineer/Manager at Advanced Mask Inspection Technology Inc

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Author

Publications (7)

Proceedings Article | 23 September 2009 Paper

Defect printability analysis by lithographic simulation from high resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Yasuko Saito, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proceedings Volume 7488, 74880A (2009) https://doi.org/10.1117/12.831475

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Scanners, Sensors, Image resolution, Optical inspection, Wafer-level optics, Printing

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Proceedings Article | 11 May 2009 Paper

Mask-LMC: lithographic simulation and defect detection from high-resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proceedings Volume 7379, 73791B (2009) https://doi.org/10.1117/12.824288

KEYWORDS: Photomasks, Inspection, Lithography, Semiconducting wafers, Scanners, Sensors, Defect detection, Optical inspection, Wafer-level optics, Image resolution

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Proceedings Article | 11 May 2009 Paper

Variable sensitivity detection (VSD) technology for screening SRAF nuisance defects

Kyoji Yamashita, Nobuyuki Harabe, Masatoshi Hirono, Yukio Tamura, Ikunao Isomura, Yoshitake Tsuji, Eiji Matsumoto

Proceedings Volume 7379, 737929 (2009) https://doi.org/10.1117/12.824323

KEYWORDS: SRAF, Inspection, Photomasks, Opacity, Defect detection, Lithography, Edge roughness, Defect inspection, Electron beam lithography, Optical proximity correction

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Proceedings Article | 17 October 2008 Paper

Flexible sensitivity inspection with TK-CMI software for criticality-awareness

Frank Driessen, Jamila Gunawerdana, Yakuko Saito, Hideo Tsuchiya, Yoshitake Tsuji

Proceedings Volume 7122, 712222 (2008) https://doi.org/10.1117/12.803593

KEYWORDS: Inspection, Photomasks, Defect detection, Optical proximity correction, Data processing, Defect inspection, Data conversion, Manufacturing, Mask making, Databases

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Proceedings Article | 5 April 2007 Paper

Development of advanced mask inspection optics with transmitted and reflected light image acquisition

Ryoichi Hirano, Riki Ogawa, Hitoshi Suzuki, Kenichi Takahara, Yoshitake Tsuji, Shingo Murakami, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 6518, 65181U (2007) https://doi.org/10.1117/12.712774

KEYWORDS: Inspection, Photomasks, Image transmission, Image acquisition, Defect detection, Sensors, Lithography, Defect inspection, Optical inspection, 193nm lithography

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Proceedings Article | 20 October 2006 Paper

Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics

Yoshitake Tsuji, Nobutaka Kikuiri, Shingo Murakami, Kenichi Takahara, Ikunao Isomura, Yukio Tamura, Kyoji Yamashita, Ryoichi Hirano, Motonari Tateno, Kenichi Matsumura, Naohisa Takayama, Kinya Usuda

Proceedings Volume 6349, 63493M (2006) https://doi.org/10.1117/12.692811

KEYWORDS: Inspection, Image transmission, Computer aided design, Photomasks, Optical inspection, Image processing, Laser optics, Image enhancement, Image sensors, Point spread functions

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Proceedings Article | 19 May 2006 Paper

Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond

Nobutaka Kikuiri, Shingo Murakami, Hideo Tsuchiya, Motonari Tateno, Kenichi Takahara, Shinichi Imai, Ryoichi Hirano, Ikunao Isomura, Yoshitake Tsuji, Yukio Tamura, Kenichi Matsumura, Kinya Usuda, Masao Otaki, Osamu Suga, Katsumi Ohira

Proceedings Volume 6283, 62830Y (2006) https://doi.org/10.1117/12.683579

KEYWORDS: Inspection, Photomasks, Image transmission, Laser optics, Optical inspection, Lithography, Defect detection, Sensors, Objectives, Image sensors

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Showing 5 of 7 publications

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