Yoshitake Tsuji
Chief Engineer/Manager at Advanced Mask Inspection Technology Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Lithography, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Printing, Photomasks, Semiconducting wafers

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Electron beam lithography, Defect detection, Opacity, Inspection, Photomasks, Optical proximity correction, SRAF, Edge roughness, Defect inspection

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Photomasks, Semiconducting wafers

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Defect detection, Databases, Manufacturing, Inspection, Data processing, Photomasks, Optical proximity correction, Mask making, Data conversion, Defect inspection

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Image acquisition, Optical inspection, Image transmission, Photomasks, 193nm lithography, Defect inspection

Showing 5 of 7 publications
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