Ms. Yosuke Shirata Profile

Yosuke Shirata

at Nikon Corp

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 18 March 2015 Paper

Latest performance of ArF immersion scanner NSR-S630D for high-volume manufacturing for 7nm node

Takayuki Funatsu, Yusaku Uehara, Yujiro Hikida, Akira Hayakawa, Satoshi Ishiyama, Toru Hirayama, Hirotaka Kono, Yosuke Shirata, Yuichi Shibazaki

Proc. SPIE. 9426, Optical Microlithography XXVIII

KEYWORDS: Reticles, Optical parametric oscillators, Scanners, Wavefronts, Distortion, Software development, Transmittance, High volume manufacturing, Semiconducting wafers, Overlay metrology

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Proceedings Article | 31 March 2014 Paper

Immersion scanners enabling 10nm half-pitch production and beyond

Hiroyuki Egashira, Yusaku Uehara, Yosuke Shirata, Yuichi Shibazaki, Jun Ishikawa, Takayuki Funatsu, Masanori Ohba

Proc. SPIE. 9052, Optical Microlithography XXVII

KEYWORDS: Wafer-level optics, Reticles, Data modeling, Calibration, Scanners, Wavefronts, Control systems, Distortion, Semiconducting wafers, Overlay metrology

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Proceedings Article | 12 April 2013 Paper

High-productivity immersion scanner enabling 1xnm hp manufacturing

Yosuke Shirata, Yuichi Shibazaki, Junichi Kosugi, Takahisa Kikuchi, Yasuhiro Ohmura

Proc. SPIE. 8683, Optical Microlithography XXVI

KEYWORDS: Lithography, Reticles, Atrial fibrillation, Sensors, Scanners, Manufacturing, Distortion, Semiconducting wafers, Overlay metrology, Fiber optic illuminators

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Proceedings Article | 13 March 2012 Paper

High overlay accuracy for double patterning using an immersion scanner

Yuji Shiba, Katsushi Makino, Yasuhiro Morita, Chihaya Motoyoshi, Hajime Yamamoto, Jin Udagawa, Takahisa Kikuchi, Yosuke Shirata, Yuuki Ishii

Proc. SPIE. 8326, Optical Microlithography XXV

KEYWORDS: Cooling systems, Lithography, Reticles, Scanners, Distortion, Semiconductor manufacturing, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

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Proceedings Article | 23 March 2011 Paper

Stability and calibration of overlay and focus control for a double patterning immersion scanner

Masahiko Yasuda, Shinji Wakamoto, Hiroto Imagawa, Shinya Takubo, Yuuji Shiba, Takahisa Kikuchi, Yosuke Shirata, Yuuki Ishii

Proc. SPIE. 7973, Optical Microlithography XXIV

KEYWORDS: Metrology, Interferometers, Calibration, Scanners, Control systems, Distortion, Computer programming, Double patterning technology, Semiconducting wafers, Overlay metrology

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Proceedings Article | 10 March 2010 Paper

Double patterning lithography study with high overlay accuracy

Takahisa Kikuchi, Yosuke Shirata, Masahiko Yasuda, Yasuhiro Iriuchijima, Kengo Takemasa, Ryo Tanaka, Andrew Hazelton, Yuuki Ishii

Proc. SPIE. 7640, Optical Microlithography XXIII

KEYWORDS: Lithography, Optical lithography, Glasses, Scanners, Scanning electron microscopy, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

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Proceedings Article | 10 March 2010 Paper

Actual performance data analysis of overlay, focus, and dose control of an immersion scanner for double patterning

Shinji Wakamoto, Yuho Kanaya, Junichi Kosugi, Noriaki Kasai, Hisashi Nishinaga, Kenichi Shiraishi, Yosuke Shirata, Yuuki Ishii

Proc. SPIE. 7640, Optical Microlithography XXIII

KEYWORDS: Reticles, Metrology, Interferometers, Sensors, Computer programming, Servomechanisms, Artificial intelligence, Double patterning technology, Semiconducting wafers, Overlay metrology

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Showing 5 of 7 publications

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