You Arisawa
at SCREEN Semiconductor Solutions Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Lithography, Polymers, Silicon, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Structural design, Photoresist processing, Semiconducting wafers, Stochastic processes

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Annealing, Materials processing, Control systems, Oxygen, Directed self assembly, Oxidation

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Lithography, Metals, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 4 June 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Antireflective coatings, Etching, Silicon, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, System on a chip, Photoresist developing

Showing 5 of 7 publications
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