Dr. Young-Chang Kim
at Mentor Graphics Inc
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Data modeling, Etching, Inspection, Neural networks, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Databases, Metals, Scanners, Inspection, Computer simulations, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Logic, Visualization, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Optical lithography, Calibration, Etching, Metals, Machine learning, Optical proximity correction, Convolution, Statistical modeling, Mahalanobis distance

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Metrology, Data modeling, Calibration, Atomic force microscopy, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Data conversion, Optical calibration, Instrument modeling

Showing 5 of 30 publications
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