Dr. Young Jong Park
Application Engineer at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Electronics, Metrology, Optical lithography, Polarization, Calibration, Etching, Optical testing, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Metrology, Logic, Deep ultraviolet, Scanners, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Edge roughness

Proceedings Article | 1 May 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Diffraction, Lithographic illumination, Cadmium, Photomasks, Extreme ultraviolet, Compact discs, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Diffraction gratings

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Metrology, Data modeling, Computing systems, Physics, Optical alignment, Semiconducting wafers, Nanofabrication, Overlay metrology, Instrument modeling

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