Young-Sun Hwang
at SK Hynix Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Overlay metrology, Metrology, Target detection, Semiconducting wafers, Optical proximity correction, Resolution enhancement technologies, Reticles, Lithography, Optical lithography, Etching

Proceedings Article | 12 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Overlay metrology, Optical alignment, Semiconducting wafers, Signal processing, Chemical mechanical planarization, Double patterning technology, Resolution enhancement technologies, Thermal effects, Lithography, Process control

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconducting wafers, Thin film coatings, Overlay metrology, Optical alignment, Immersion lithography, Materials processing, Scanners, Protactinium, Calibration, Photomasks

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Double patterning technology, Lithography, Photomasks, Optical lithography, Etching, Neodymium, Composites, 193nm lithography, Scanning electron microscopy, Photomicroscopy

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Optical alignment, Etching, Carbon, Absorption, Photomasks, Reflection, Lithography, Resolution enhancement technologies, Photoresist processing, Optical lithography

Showing 5 of 14 publications
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