Dr. Young M. Ham
Global R&D Director at Photronics Inc
SPIE Involvement:
Author
Publications (46)

Proceedings Article | 20 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Lithography, Optical lithography, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Metals, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Computer simulations, Photomasks, Machine learning, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling, Resolution enhancement technologies

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Etching, Quartz, 3D metrology, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Electron beam lithography, Image processing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers, Stochastic processes

Showing 5 of 46 publications
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