YoungJin Kim
at Merck Electronics
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 April 2024 Presentation
Masato Suzuki, Rikio Kozaki, Yida Liu, Tetsumasa Takaichi, Toshiya Okamura, YoungJin Kim, YoungJun Her, Hengpeng Wu, Kun Si, Chenyang Ma, Mark Maturi, Philipp Fackler, Mansour Moinpour, Ralph Dammel, Yi Cao
Proceedings Volume 12957, 129570T (2024) https://doi.org/10.1117/12.3012914
KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Industry, Thermal stability, Process control, Printing, Polymers, Industrial applications, Film thickness

Proceedings Article | 1 May 2023 Presentation + Paper
Masato Suzuki, Youngjin Kim, Youngjun Her, Hengpeng Wu, Kun Si, Mark Marcello Maturi, Philipp Hans Fackler, Mansour Moinpour, Ralph Dammel, Yi Cao
Proceedings Volume 12498, 1249813 (2023) https://doi.org/10.1117/12.2659716
KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Optical lithography, Line width roughness, Lithography, Etching, Photoresist materials

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