Youngmi Kim
at Dongbu HiTek Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Etching, Metals, Error analysis, Head, Bridges, Photomasks, Logic devices, Optical proximity correction, Model-based design, Resolution enhancement technologies

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Image processing, Silicon, Manufacturing, Microelectronics, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Reticles, Cadmium, Data modeling, Calibration, Databases, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Statistical modeling

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Databases, Metals, Bridges, Photomasks, Optical proximity correction, Semiconducting wafers

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