Dr. Yow-Gwo Wang Profile

Dr. Yow-Gwo Wang

Doctor at Intel Corp

SPIE Involvement:

Author

Publications (17)

SPIE Journal Paper | 16 May 2017 Open Access

Impact of tool design on defect detection sensitivity in extreme ultraviolet actinic blank inspection

Yow-Gwo Wang, Andrew Neureuther, Patrick Naulleau

JM3, Vol. 16, Issue 02, 023502, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023502

KEYWORDS: Signal to noise ratio, Extreme ultraviolet, Inspection, Defect detection, Interference (communication)

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 24 March 2017 Paper

Impact of EUV SRAF on Bossung tilt

Yow-Gwo Wang, Stephen Hsu, Robert Socha, Andy Neureuther, Patrick Naulleau

Proceedings Volume 10143, 1014320 (2017) https://doi.org/10.1117/12.2260160

KEYWORDS: SRAF, Photomasks, Extreme ultraviolet lithography, 3D image processing, Diffraction, 3D modeling, Zernike polynomials, Imaging systems, Image processing, Lithographic illumination, Critical dimension metrology

Read Abstract +

Proceedings Article | 24 March 2017 Presentation + Paper

Impact of tool design on defect detection sensitivity for EUV actinic blank inspection

Yow-Gwo Wang, Andy Neureuther, Patrick Naulleau

Proceedings Volume 10143, 101430M (2017) https://doi.org/10.1117/12.2260193

KEYWORDS: Signal to noise ratio, Defect detection, Synchrotrons, Plasma, Optical design, Speckle, EUV optics, Defect inspection, Inspection equipment, Optical inspection, Extreme ultraviolet lithography, Optical resolution, Photomasks

Read Abstract +

SPIE Journal Paper | 16 March 2017 Open Access

Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool

Yow-Gwo Wang, Andrew Neureuther, Patrick Naulleau

JM3, Vol. 16, Issue 01, 013504, (March 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013504

KEYWORDS: Signal to noise ratio, Interference (communication), Inspection, Speckle, Extreme ultraviolet, Optical design, Cameras, Defect detection, Speckle pattern, Photomasks

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 3 October 2016 Paper

Impact of noise sources and optical design on defect sensitivity for EUV actinic pattern inspection

Yow-Gwo Wang, Andy Neureuther, Patrick Naulleau

Proceedings Volume 9985, 99850I (2016) https://doi.org/10.1117/12.2242794

KEYWORDS: Inspection, Signal to noise ratio, Extreme ultraviolet, Speckle, Interference (communication), Cameras, Optical design, Photomasks, Speckle pattern, 3D modeling

Read Abstract +

SPIE Journal Paper | 12 July 2016

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

Markus Benk, Antoine Wojdyla, Weilun Chao, Farhad Salmassi, Sharon Oh, Yow-Gwo Wang, Ryan Miyakawa, Patrick Naulleau, Kenneth Goldberg

JM3, Vol. 15, Issue 03, 033501, (July 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.033501

KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel

Read Abstract +

Proceedings Article | 11 April 2016 Paper

Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study

Yow-Gwo Wang, Andrew Neureuther, Patrick Naulleau

Proceedings Volume 9776, 97761D (2016) https://doi.org/10.1117/12.2220277

KEYWORDS: Phase shifts, Inspection, Signal to noise ratio, Extreme ultraviolet, Phase contrast, Absorption, Interference (communication), Speckle, Apodization, Defect inspection

Read Abstract +

Proceedings Article | 18 March 2016 Paper

Emulation of anamorphic imaging on the SHARP EUV mask microscope

Markus Benk, Antoine Wojdyla, Weilun Chao, Farhad Salmassi, Sharon Oh, Yow-Gwo Wang, Ryan Miyakawa, Patrick Naulleau, Kenneth Goldberg

Proceedings Volume 9776, 97761J (2016) https://doi.org/10.1117/12.2219294

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lenses, Extreme ultraviolet, Microscopes, Scanners, EUV optics, Semiconducting wafers, Modulation, Multilayers, Nickel

Read Abstract +

Proceedings Article | 3 November 2015 Paper

Examination of phase retrieval algorithms for patterned EUV mask metrology

Rene Claus, Yow-Gwo Wang, Antoine Wojdyla, Markus Benk, Kenneth Goldberg, Andrew Neureuther, Patrick Naulleau

Proceedings Volume 9635, 96350F (2015) https://doi.org/10.1117/12.2197868

KEYWORDS: Phase shifts, Phase retrieval, Photomasks, Extreme ultraviolet, Image retrieval, Metrology, Microscopes, Computer simulations, Image restoration, 3D metrology

Read Abstract +

Proceedings Article | 28 October 2015 Paper

The study of phase effects in EUV mask pattern defects

Yow-Gwo Wang, Andy Neureuther, Patrick Naulleau

Proceedings Volume 9635, 96350D (2015) https://doi.org/10.1117/12.2197769

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Phase shifts, Defect detection, 3D modeling, Polarization, Extreme ultraviolet lithography, Reflectivity, Projection lithography, Germanium, Nickel, Neodymium, Near field, Absorption, Ions

Read Abstract +

Proceedings Article | 16 March 2015 Paper

Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, Kenneth Goldberg, Andy Neureuther, Ted Liang, Patrick Naulleau

Proceedings Volume 9422, 94221C (2015) https://doi.org/10.1117/12.2087532

KEYWORDS: Signal to noise ratio, Phase contrast, Phase shifts, Apodization, Extreme ultraviolet, Inspection, Microscopes, Interference (communication), Absorption, Defect detection

Read Abstract +

Proceedings Article | 16 March 2015 Paper

Phase measurements of EUV mask defects

Rene Claus, Yow-Gwo Wang, Antoine Wojdyla, Markus Benk, Kenneth Goldberg, Andrew Neureuther, Patrick Naulleau, Laura Waller

Proceedings Volume 9422, 942217 (2015) https://doi.org/10.1117/12.2087195

KEYWORDS: Extreme ultraviolet, Zone plates, Photomasks, Phase contrast, Phase measurement, Algorithm development, Extreme ultraviolet lithography, Microscopes, Lithography, Imaging systems

Read Abstract +

SPIE Journal Paper | 23 February 2015 Open Access

Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope

Markus Benk, Ryan Miyakawa, Weilun Chao, Yow-Gwo Wang, Antoine Wojdyla, David Johnson, Alexander Donoghue, Kenneth Goldberg

JM3, Vol. 14, Issue 01, 013507, (February 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.013507

KEYWORDS: Phase contrast, Extreme ultraviolet, Microscopes, Digital image correlation, Photomasks, Silicon, Scanning electron microscopy, Phase shifts, Lenses, Point spread functions

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 8 October 2014 Paper

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

Markus Benk, Ryan Miyakawa, Weilun Chao, Yow-Gwo Wang, Antoine Wojdyla, David Johnson, Alexander Donoghue, Kenneth Goldberg

Proceedings Volume 9235, 92350K (2014) https://doi.org/10.1117/12.2065513

KEYWORDS: Phase contrast, Microscopes, Photomasks, Digital image correlation, Extreme ultraviolet, Silicon, Lenses, Scanning electron microscopy, Phase shifts, Point spread functions

Read Abstract +

Proceedings Article | 8 October 2014 Paper

Phase-enhanced defect sensitivity for EUV mask inspection

Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Kenneth Goldberg, Andy Neureuther, Patrick Naulleau

Proceedings Volume 9235, 92350L (2014) https://doi.org/10.1117/12.2069291

KEYWORDS: Signal to noise ratio, Inspection, Phase shifts, Phase contrast, Photomasks, Apodization, Speckle, Extreme ultraviolet, Interference (communication), Defect inspection

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Zernike phase contrast microscope for EUV mask inspection

Yow-Gwo Wang, Ryan Miyakawa, Andrew Neureuther, Patrick Naulleau

Proceedings Volume 9048, 904810 (2014) https://doi.org/10.1117/12.2048180

KEYWORDS: Phase contrast, Phase shifts, Apodization, Signal to noise ratio, Extreme ultraviolet, Inspection, Microscopes, Photomasks, Interference (communication), Speckle

Read Abstract +

Proceedings Article | 11 February 2012 Paper

Magnetically tunable metallic photonic crystals immersed in liquid crystal for terahertz wave

Ru-Pin Pan, Chih-Chang Shih, Tsung-Ta Tang, Yow-Gwo Wang, Hsin-Ying Wu, Chia-Jen Lin, Ci-Ling Pan

Proceedings Volume 8279, 82790J (2012) https://doi.org/10.1117/12.915594

KEYWORDS: Terahertz radiation, Liquid crystals, Photonic crystals, Transmittance, Refraction, Magnetism, Nickel, Tunable filters, Light wave propagation, Silica

Read Abstract +

Showing 5 of 17 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years