Mr. Yuan Zhang Profile

Yuan Zhang

Director at SUSS MicroTec Inc

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 8 November 2005 Paper

Designing to win in sub-90nm mask production

Yuan Zhang

Proceedings Volume 5992, 599229 (2005) https://doi.org/10.1117/12.637610

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Reticles, Design for manufacturing, Lithography, Binary data, Manufacturing, Yield improvement, Semiconductors

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Proceedings Article | 5 November 2005 Paper

Haze prevention and phase/transmission preservation through cleaning process optimization

Jennifer Qin, Yuan Zhang, Rob Delgado, Barry Rockwell, Florence Tan, Khoi Phan, Lothar Berger, Min Liu, Uwe Dietez

Proceedings Volume 5992, 59921E (2005) https://doi.org/10.1117/12.633170

KEYWORDS: Reticles, Photomasks, Air contamination, Semiconducting wafers, Pellicles, Ultraviolet radiation, Ions, Scanners, Inspection, Chromatography

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Proceedings Article | 28 June 2005 Paper

Interaction and balance of mask write time and design RET strategies

Yuan Zhang, Rick Gray, O. Nakagawa, Puneet Gupta, Henry Kamberian, Guangming Xiao, Rand Cottle, Chris Progler

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617146

KEYWORDS: Molybdenum, Source mask optimization, Computed tomography, Photomasks, Resolution enhancement technologies, Design for manufacturing, Optical proximity correction, Error analysis, Statistical analysis, Lithography

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Proceedings Article | 12 May 2005 Paper

Investigation of viable approaches to AAPSM intensity imbalance reduction for 65nm lithography

Tejas Jhaveri, Rand Cottle, Yuan Zhang, Christopher Progler

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.593219

KEYWORDS: Manufacturing, Photomasks, Electroluminescence, Etching, Critical dimension metrology, Lithography, Standards development, Phase shifts, Scanning electron microscopy, Optics manufacturing

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Proceedings Article | 12 May 2005 Paper

The effect of polarized 193nm irradiation on photomask haze formation

Y. Kim, H. Kang, Yuan Zhang, Chuong Tran, Nigel Farrar, Jennifer Qin, Barry Rockwell, H. Cho, Rand Cottle, David Chan, Pat Martin, S. Choi, Chris Progler

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598913

KEYWORDS: Photomasks, Air contamination, Pellicles, Laser irradiation, Ions, Pulsed laser operation, Chromium, Chromatography, Inspection, Laser scanners

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Proceedings Article | 5 May 2005 Paper

Mask cost analysis via write time estimation

Yuan Zhang, Rick Gray, Seurien Chou, Barry Rockwell, Guangming Xiao, Henry Kamberian, Rand Cottle, Alex Wolleben, Chris Progler

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.598884

KEYWORDS: Data modeling, Optical proximity correction, Photomasks, Computed tomography, Manufacturing, Statistical analysis, Statistical modeling, Resolution enhancement technologies, Error analysis, Inspection

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Proceedings Article | 5 May 2005 Paper

Device and lithography contextual mask rule generation

Young Mog Ham, Brian Dillon, Chris Progler, Kory Goldammer, Zhiziang Jin, Gary Green, R. Scott Mackay, Hitendra Divecha, Victor Boksha, Pat Martin, Mitch Heins, Yuan Zhang, Kurt Davis, Rafik Marutyan, Karen Martirosyan, Sergei Bakarian

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600730

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Critical dimension metrology, Manufacturing, Resolution enhancement technologies, Electron beam lithography, Mask making, Design for manufacturing

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Proceedings Article | 27 January 2005 Paper

Photomask development for 90-nm technology

Yuan Zhang, Rand Cottle, Scott Mackay, Guangming Xiao, James Unruh, Christopher Progler

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.570482

KEYWORDS: Photomasks, Manufacturing, Lithography, Chromium, Binary data, Quartz, Semiconductors, Phase shifts, SRAF, Etching

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Proceedings Article | 19 July 2000 Paper

Analysis of reticle deformation, reduction ratio, and MEEF of future optical lithography

Kenichi Kotoku, Koichi Mikami, Ryuichi Ebinuma, Yuichi Yamada, Yuan Zhang

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392069

KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Semiconductors, Lithography, Distortion, Optical lithography, Projection systems, Manufacturing, Tolerancing

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Proceedings Article | 14 June 1999 Paper

Wafer mapping for stepper effects characterization

Yuan Zhang, Ronald Carpio, Lucian Wagner, Peter Golubtsov

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350812

KEYWORDS: Semiconducting wafers, Metrology, Optical lithography, Composites, Lithography, Software development, Wafer-level optics, Capacitance, Particles, Inspection

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Proceedings Article | 7 July 1997 Paper

Importance of wafer flatness for CMP and lithography

Yuan Zhang, Lucian Wagner, Peter Golbutsov

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275916

KEYWORDS: Semiconducting wafers, Chemical mechanical planarization, Lithography, Semiconductors, Data conversion, Silicon, Critical dimension metrology, Silicon films, Thin films, Printing

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Proceedings Article | 3 September 1996 Paper

Design of main-body structure of laser-cutting machine for optical disks

Hui-Qin Ge, Li-Ding Wang, Xiao-Dong Tong, Yuan Zhang, Li-Xin Liu

Proceedings Volume 2931, (1996) https://doi.org/10.1117/12.248713

KEYWORDS: Optical discs, Lead, Etching, Structural design, Laser optics, Photography, Head, Computer programming, Actuators, Computing systems

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Showing 5 of 12 publications

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