Yuichi Shibazaki
Sector Manager / Fellow at Nikon Corp
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Optical parametric oscillators, Sensors, Scanners, Distortion, Sensing systems, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Scanners, Manufacturing, Control systems, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical parametric oscillators, Scanners, Manufacturing, Distortion, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Optical parametric oscillators, Manufacturing, Distortion, 3D modeling, Precision measurement, Optical alignment, Semiconducting wafers, Systems modeling, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Light sources, Optical lithography, Atrial fibrillation, Lithographic illumination, Scanners, Manufacturing, Wavefronts, Control systems, Distortion, Signal processing, Immersion lithography, Optical alignment, Semiconducting wafers, Yield improvement

Showing 5 of 18 publications
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