CONFERENCE PROCEEDINGS
Advanced Search
Yuichiro Miyata
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 26 March 2019 Paper
The defect mitigation on EUV stack by track based technology
Naoki Shibata, Lior Huli, Corey Lemley, Yuichiro Miyata, Dave Hetzer, Toshiharu Wada, Akiteru Ko, Shinichiro Kawakami, Akiko Kai, Takahiro Shiozawa, Hidetsugu Yano, Kenichi Ueda, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Nelson Felix, Cody Murray, Alex Hubbard
Proceedings Volume 10957, 109571J (2019) https://doi.org/10.1117/12.2514885
KEYWORDS: Extreme ultraviolet, Optical lithography, Bridges, Extreme ultraviolet lithography, Inspection, Photoresist processing, Coating, Particles, Semiconducting wafers
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top