Mr. Yukihiro Masuda Profile

Yukihiro Masuda

Director Special Project at D2S Inc

SPIE Involvement:

Author

Publications (4)

SPIE Journal Paper | 14 February 2024

Curvilinear mask process correction embedded on multi-beam mask writer

Noriaki Nakayamada, Haruyuki Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, Nagesh Shirali, Yukihiro Masuda, Aki Fujimura

JM3, Vol. 23, Issue 01, 011206, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011206

KEYWORDS: Design, Etching, Vestigial sideband modulation, Printing, Dose control, Raster graphics, Bias correction, Lithography, Electron beam lithography, Scanning electron microscopy

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Proceedings Article | 13 July 2017 Paper

Mask CD relationship to temperature at the time backscatter is received

Harold Zable, Tom Kronmiller, Ryan Pearman, Bill Guthrie, Nagesh Shirali, Yukihiro Masuda, Takashi Kamikubo, Noriaki Nakayamada, Aki Fujimura

Proceedings Volume 10454, 104540C (2017) https://doi.org/10.1117/12.2282030

KEYWORDS: Metrology, Thermal effects, Photomasks, Temperature metrology, Time metrology, Thermal modeling, Mathematics, Backscatter, Beam shaping, Vestigial sideband modulation

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Proceedings Article | 13 July 2017 Paper

GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000

Harold Zable, Hironobu Matsumoto, Kenichi Yasui, Ryosuke Ueba, Noriaki Nakayamada, Nagesh Shirali, Yukihiro Masuda, Ryan Pearman, Aki Fujimura

Proceedings Volume 10454, 104540D (2017) https://doi.org/10.1117/12.2281922

KEYWORDS: Photomasks, Extreme ultraviolet, Point spread functions, Vestigial sideband modulation, Semiconducting wafers, Manufacturing, Nanoimprint lithography, Line edge roughness, Lithography, SRAF

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SPIE Journal Paper | 23 March 2016

Correction of resist heating effect on variable shaped beam mask writer

Noriaki Nakayamada, Mizuna Suganuma, Haruyuki Nomura, Yasuo Kato, Takashi Kamikubo, Munehiro Ogasawara, Harold Zable, Yukihiro Masuda, Aki Fujimura

JM3, Vol. 15, Issue 02, 021012, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021012

KEYWORDS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology

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