Dr. Yukiko Kikuchi Profile

Dr. Yukiko Kikuchi

Researcher at Toshiba Materials Co Ltd

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 8 April 2011 Paper

Study of ion implantation into EUV resist for LWR improvement

Yukiko Kikuchi, Daisuke Kawamura, Hiroyuki Mizuno

Proceedings Volume 7969, 79692H (2011) https://doi.org/10.1117/12.879359

KEYWORDS: Line width roughness, Etching, Ion implantation, Extreme ultraviolet, Ions, Photomasks, Extreme ultraviolet lithography, Dry etching, Semiconducting wafers, Photoresist processing

Read Abstract +

Proceedings Article | 23 March 2010 Paper

Challenges of EUVL resist process toward practical application

Shinichi Ito, Yukiko Kikuchi, Daisuke Kawamura, Eishi Shiobara, Keiichi Tanaka, Hitoshi Kosugi, Junichi Kitano, Takayuki Toshima

Proceedings Volume 7636, 76362V (2010) https://doi.org/10.1117/12.846260

KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet, Surface plasmons, Photomasks, Lithography, Nanoimprint lithography, Line edge roughness

Read Abstract +

Proceedings Article | 23 March 2010 Paper

Process liability evaluation for beyond 22nm node using EUVL

Kazuo Tawarayama, Hajime Aoyama, Kentaro Matsunaga, Yukiyasu Arisawa, Taiga Uno, Shunko Magoshi, Suigen Kyoh, Yumi Nakajima, Ryoichi Inanami, Satoshi Tanaka, Ayumi Kobiki, Yukiko Kikuchi, Daisuke Kawamura, Kosuke Takai, Koji Murano, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

Read Abstract +

Proceedings Article | 12 April 2007 Paper

Resist evaluation for EUV application at ASET

Doohoon Goo, Yuusuke Tanaka, Yukiko Kikuchi, Hiroaki Oizumi, Iwao Nishiyama

Proceedings Volume 6519, 65191M (2007) https://doi.org/10.1117/12.711980

KEYWORDS: Line width roughness, Polymers, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Modulation, Printing, Photoresist processing, Additive manufacturing

Read Abstract +

Although EUV lithography has been prepared for next generation litho-technique for several years, there are still lots of obstacles on its way. Especially, phase defect from the mask, and immaturity in the resist should be solved as soon as possible because they are directly related to realizing patterns on the wafer. ASET has been focusing on these two problems, that is, the mask-related defect control and the resist screening for EUV application. In this study, we concentrate on the resist evaluation for the EUV lithography application, mainly commercial CAR (Chemically- Amplified Resist) type resist, for example, ArF resist based on polymethacrylate and KrF resist based on poly(4- hydroxystyrene) (PHS). We screened tens of resists in viewpoint of resolution, photo-speed, and LWR (Line Width Roughness). We used two METs (Micro-Exposure Tools). The one is HiNA in ASET and the other is MET in Lawrence Berkeley National Lab. (LBNL) to evaluate resist. And we used EUV masks fabricated by DNP and ASET. Some resist showed modulation on the wafer for 28nm-hp line and space pattern and some resist showed very high photo-speed about 5mJ/cm². Photo-speed could be improved about 25% by controlling the amount of additives, PAG and quencher. However, improvement in photo-speed caused degradation in resolution. This means there are trade-off relation between resolution and photo-speed. And we also evaluated polymer-bound PAG resist, which showed new possibility for EUV resist. And we encountered unexpected problem, pattern lifting, which was solved by using bufferlayer to increase attachment force between resist and wafer surface. We conclude that polymer bound PAG resist is a good approach to lower LWR of resist for EUVL application and bufferlayer tuning and matching with resist is also needed for low LWR. The EUVL masks were fabricated by Dai Nippon Printing Co., Ltd. The HiNA set-3 projection optics were developed and provided by Nikon Corporation. This work was supported by NEDO.

Proceedings Article | 16 March 2007 Paper

Fidelity of rectangular patterns printed with 0.3-NA MET optics

Yuusuke Tanaka, Yukiko Kikuchi, DooHoon Goo, Iwao Nishiyama

Proceedings Volume 6517, 65172L (2007) https://doi.org/10.1117/12.711900

KEYWORDS: Diffusion, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Printing, EUV optics, Photoresist processing, Optical lithography, Lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Printability of contact-hole patterns in EUVL using 0.3-NA HiNA optics

Yuusuke Tanaka, Hiroaki Oizumi, Yukiko Kikuchi, DooHoon Goo, Fumiaki Kumasaka, Iwao Nishiyama

Proceedings Volume 6151, 61512S (2006) https://doi.org/10.1117/12.656126

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Optical lithography, Lithography, Extreme ultraviolet, Binary data, Optical proximity correction, Projection systems, Printing, Mirrors

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Sub-32nm patterning using EUVL at ASET

Doohoon Goo, Yuusuke Tanaka, Yukiko Kikuchi, Hiroaki Oizumi, Iwao Nishiyama

Proceedings Volume 6151, 61512R (2006) https://doi.org/10.1117/12.656124

KEYWORDS: Extreme ultraviolet lithography, Line width roughness, Photomasks, Extreme ultraviolet, Lithography, Immersion lithography, Semiconducting wafers, Resolution enhancement technologies, Optical lithography, Nanoimprint lithography

Read Abstract +

Proceedings Article | 22 March 2006 Paper

Evaluation of resolution and LER in the resist patterns replicated by EUV microexposure tools

Yukiko Kikuchi, Yuusuke Tanaka, Hiroaki Oizumi, Fumiaki Kumasaka, DooHoon Goo, Iwao Nishiyama

Proceedings Volume 6151, 615107 (2006) https://doi.org/10.1117/12.655106

KEYWORDS: Line edge roughness, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Photomasks, Optics manufacturing, Reflectivity, Semiconducting wafers, Manufacturing, Imaging systems

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Preparation of high-aspect-ratio 70-nm patterns by supercritical drying technique in proximity x-ray lithography

Yukiko Kikuchi, Takuya Fukuda, Seiichi Shishiguchi, Kaoru Masuda, Nobuyuki Kawakami

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472268

KEYWORDS: Semiconducting wafers, X-ray lithography, Liquids, Photoresist processing, Dry etching, Etching, Lithography, Carbon monoxide, Photoresist developing, Molecular spectroscopy

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Up-to-date activities of PXL (proximity x-ray lithography)

Yasuji Matsui, Takao Taguchi, Yoshinori Nakayama, Yukiko Kikuchi, Shinji Tsuboi, Hiroaki Sumitani

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438381

KEYWORDS: Photomasks, Optical alignment, Distortion, Lithography, Overlay metrology, Optical lithography, Etching, Semiconducting wafers, Transistors, X-rays

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Yoshinori Nakayama, Hajime Aoyama, Shinji Tsuboi, Hiroshi Watanabe, Yukiko Kikuchi, Mizunori Ezaki, Yasuji Matsui, Tetsuo Morosawa, Kenichi Saito, Shigehisa Ohki, Tadahito Matsuda

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390033

KEYWORDS: Photomasks, X-rays, Image processing, Distortion, Silicon carbide, Silicon, Lithography, Mask making, X-ray lithography, Interferometers

Read Abstract +

Proceedings Article | 25 August 1999 Paper

Printability of programmed x-ray mask defects

Hiroshi Watanabe, H. Yabe, Yukiko Kikuchi, K. Marumoto, Yasuji Matsui

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360226

KEYWORDS: Photomasks, X-rays, Opacity, Critical dimension metrology, X-ray lithography, Inspection, Defect inspection, Error analysis, Optical simulations, Light sources

Read Abstract +

Proceedings Article | 25 June 1999 Paper

Application of two-wavelength optical heterodyne alignment system in XS-1

Soichiro Mitsui, Takao Taguchi, Yukiko Kikuchi, Hajime Aoyama, Yasuji Matsui, Masanori Suzuki, Tsuneyuki Haga, Makoto Fukuda, Hirofumi Morita, Akinori Shibayama

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351120

KEYWORDS: Optical alignment, Semiconducting wafers, Photomasks, Silicon, Heterodyning, Wafer-level optics, Reflection, Reflectivity, Lithography, Wafer testing

Read Abstract +

Proceedings Article | 9 July 1992 Paper

Study of single-layer e-beam lithography for x-ray mask making

Yukiko Kikuchi, Yuji Takigami, Ichiro Mori, Yoshio Gomei

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136010

KEYWORDS: X-ray lithography, X-rays, Scattering, Electron beam lithography, Electrons, Silicon, Mask making, Photomasks, Laser scattering, Reactive ion etching

Read Abstract +

Showing 5 of 14 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years