Ms. Yuko Tsutsui Ito Profile

Yuko Tsutsui Ito

at SANKEN Osaka Univ

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Publications (6)

Proceedings Article | 9 April 2024 Poster + Paper

Study on resist performance of inorganic-organic resist materials for EUV and EB lithography

Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto, Takahiro Kozawa

Proceedings Volume 12957, 129572F (2024) https://doi.org/10.1117/12.3025195

KEYWORDS: Extreme ultraviolet lithography, Lithography, Metals, Annealing, Extreme ultraviolet, Etching, Reactive ion etching, Particles, Miniaturization, Design

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Proceedings Article | 9 April 2024 Presentation + Paper

Dissolution dynamics of copolymer of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12957, 129570D (2024) https://doi.org/10.1117/12.3011199

KEYWORDS: Copolymers, Stochastic processes, Lithography, Line width roughness, Semiconductors, Photoresist processing, Materials processing, Extreme ultraviolet lithography, Polymers

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Proceedings Article | 21 November 2023 Presentation + Paper

Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine

Hitomi Betsumiya, Yuqing Jin, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12750, 127500J (2023) https://doi.org/10.1117/12.2687340

KEYWORDS: Decision trees, Support vector machines, Polymers, Machine learning, Viscosity, Polymer thin films, Materials properties, Film thickness

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Proceedings Article | 1 May 2023 Presentation + Paper

Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12498, 124980I (2023) https://doi.org/10.1117/12.2658138

KEYWORDS: Ultraviolet radiation, Photoacid generators, Stochastic processes, Line width roughness, Semiconductors, Photoresist processing, Materials processing, Lithography

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Proceedings Article | 1 May 2023 Poster + Paper

Dependence of swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution on alkyl chain length of tetraalkylammonium hydroxide

Hitomi Betsumiya, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12498, 1249829 (2023) https://doi.org/10.1117/12.2670175

KEYWORDS: Polymers, Photoresist processing, Extreme ultraviolet lithography, Miniaturization, Film thickness, Chemically amplified resists

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Proceedings Article | 25 May 2022 Presentation + Paper

Swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution studied by quartz crystal microbalance (QCM) method

Yuko Tsutsui Ito, Hitomi Betsumiya, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12055, 1205509 (2022) https://doi.org/10.1117/12.2612781

KEYWORDS: Polymers, Quartz, Crystals, Standards development, Molecules, Chemically amplified resists, Image processing, Extreme ultraviolet lithography, Semiconductors, Photoresist processing

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Showing 5 of 6 publications

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