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Yuko Ono
at Tokyo Electron AT Ltd
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Author
Publications (4)
Proceedings Article | 14 May 2004 Paper
Behavior of chemically amplified resist defects in TMAH solution: III
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534982
KEYWORDS: Polymers, Particles, Semiconducting wafers, Photoresist processing, Chemically amplified resists, Defect detection, Manufacturing, Lithography, Infrared radiation, Arsenic
Proceedings Article | 16 July 2002 Paper
Defect analysis in 157-nm photolithography process
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473505
KEYWORDS: Optical lithography, Lithography, Satellites, Coating, Semiconductors, Chemically amplified resists, Semiconducting wafers, Polymers, Thin films, Metrology
Proceedings Article | 16 July 2002 Paper
Behavior of chemically amplified resist defects in TMAH solution
Junichi Kitano, Osamu Miyahara, Yuko Ono, Yukio Kiba
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473419
KEYWORDS: Particles, Ultraviolet radiation, Semiconducting wafers, Absorption, Absorption filters, Chemically amplified resists, Microfluidics, Photoresist processing, Inspection, Process control
Proceedings Article | 22 August 2001 Paper
Postdevelopment defect evaluation
Yuko Ono, Osamu Miyahara, Yukio Kiba
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436783
KEYWORDS: Satellites, Semiconducting wafers, Silicon, Photoresist processing, Thin film coatings, Inspection, Atomic force microscopy, Defect inspection, Scanning electron microscopy, Polymers
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