Prof. Yulin Qiu
at Institute of Microelectronics
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 27 January 2005 Paper
Yulin Qiu, Baoqin Chen, Ming Liu, Qiuxia Xu, Lijun Xue, Liming Ren, Yong Hu, Shibing Long, Jing Lu, Xiaohui Kang, Ling Li, Jinru Li, Yueke Tang
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576170
KEYWORDS: Lithography, Electron beam lithography, Resolution enhancement technologies, Optical proximity correction, Microelectronics, Optical lithography, Computer aided design, Photomasks, 193nm lithography, Mask making

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