Dr. Yulu Chen
at Synopsys
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Diffraction, Scanners, Error analysis, Wavefronts, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, Aberration theory, Overlay metrology

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Microscopes, Optical lithography, Image segmentation, Reflectivity, Image analysis, 3D metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Temporal coherence, Particles, Nickel, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

Proceedings Article | 6 September 2017 Presentation + Paper
Proc. SPIE. 10410, Unconventional and Indirect Imaging, Image Reconstruction, and Wavefront Sensing 2017
KEYWORDS: Optical imaging, Coherence imaging, Optical sensing, Biomedical optics, Speckle, Scattering, Microscopy, Dielectrics, Image resolution, Motion measurement

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Tolerancing, Stochastic processes, Back end of line, Design for manufacturability

Showing 5 of 13 publications
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