Ms. Yumi Nakajima Profile

Yumi Nakajima

at Toshiba Corp

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 8 April 2011 Paper

Manufacturability of 2x-nm devices with EUV tool

Kazuo Tawarayama, Yumi Nakajima, Suigen Kyoh, Hajime Aoyama, Kentaro Matsunaga, Shunko Magoshi, Satoshi Tanaka, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7969, 79691L (2011) https://doi.org/10.1117/12.879333

KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Reactive ion etching, Extreme ultraviolet, Lithography, Lithographic illumination, Semiconducting wafers, Yield improvement, Semiconductors, Photoresist processing

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SPIE Journal Paper | 1 January 2011

Effective exposure dose monitoring technique in extreme ultraviolet lithography

Yumi Nakajima, Kentaro Kasa, Takashi Sato, Masafumi Asano, Suigen Kyoh, Hiroyuki Mizuno

JM3, Vol. 10, Issue 1, 013005, (January 2011) https://doi.org/10.1117/12.10.1117/1.3533231

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

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Proceedings Article | 27 May 2010 Paper

Effective-exposure-dose monitoring technique in EUV lithography

Yumi Nakajima, Kentaro Kasa, Takashi Sato, Masafumi Asano, Suigen Kyoh, Hiroyuki Mizuno

Proceedings Volume 7748, 774824 (2010) https://doi.org/10.1117/12.868924

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Manufacturing, Diffraction, Semiconducting wafers, Critical dimension metrology, Optical lithography, Lithographic illumination, Extreme ultraviolet

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SPIE Journal Paper | 1 April 2010

Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

JM3, Vol. 9, Issue 02, 023009, (April 2010) https://doi.org/10.1117/12.10.1117/1.3421948

KEYWORDS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography

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Proceedings Article | 23 March 2010 Paper

Process liability evaluation for beyond 22nm node using EUVL

Kazuo Tawarayama, Hajime Aoyama, Kentaro Matsunaga, Yukiyasu Arisawa, Taiga Uno, Shunko Magoshi, Suigen Kyoh, Yumi Nakajima, Ryoichi Inanami, Satoshi Tanaka, Ayumi Kobiki, Yukiko Kikuchi, Daisuke Kawamura, Kosuke Takai, Koji Murano, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

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SPIE Journal Paper | 1 October 2009

Process liability evaluation for extreme ultraviolet lithography

Hajime Aoyama, Kazuo Tawarayama, Yuusuke Tanaka, Daisuke Kawamura, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Toshiro Itani, Hiroyuki Tanaka, Yumi Nakajima, Ryoichi Inanami, Kosuke Takai, Koji Murano, Takeshi Koshiba, Kohji Hashimoto, Ichiro Mori

JM3, Vol. 8, Issue 04, 041508, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238542

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten

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Proceedings Article | 11 May 2009 Paper

Mask-induced aberration in EUV lithography

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7379, 73790P (2009) https://doi.org/10.1117/12.824266

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Diffraction, Extreme ultraviolet, Lithographic illumination, Polarization, Manufacturing, Tolerancing, Lithography, Critical dimension metrology

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Proceedings Article | 18 March 2009 Paper

Process liability evaluation for EUVL

Proceedings Volume 7271, 727120 (2009) https://doi.org/10.1117/12.813484

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Point spread functions, Semiconducting wafers, Logic, Lithography, Electronic design automation, Projection systems, Mask making

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Proceedings Article | 20 March 2008 Paper

Aberration budget in extreme ultraviolet lithography

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 6921, 69211A (2008) https://doi.org/10.1117/12.771602

KEYWORDS: Tolerancing, Diffraction, Extreme ultraviolet lithography, Error analysis, Lithography, Phase shifts, Polarization, Manufacturing, Photomasks, Extreme ultraviolet

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Showing 5 of 9 publications

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