Dr. Yunfei Deng Profile

Dr. Yunfei Deng

Principle Engineer at Siemens EDA

SPIE Involvement:

Author

Publications (47)

Proceedings Article | 16 September 2022 Paper

EUV SRAFs printing modeling with bright field mask

Chih-I Wei, Azat Latypov, Shuling Wang, Satya Sriram, Prakash Deep, Yunfei Deng, Ethan Maguire, Shumay Shang, Germain Fenger, Werner Gillijns

Proceedings Volume 12325, 1232506 (2022) https://doi.org/10.1117/12.2640532

KEYWORDS: SRAF, Semiconducting wafers, Stochastic processes, Data modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Calibration, Line width roughness

Read Abstract +

Proceedings Article | 22 February 2021 Paper

Fast rigorous modeling of photoresist in lithography

David Fryer, Ignat Moskalenko, Germain Fenger, Daman Khaira, Yunfei Deng, Yuri Granik

Proceedings Volume 11613, 116130H (2021) https://doi.org/10.1117/12.2584771

KEYWORDS: SRAF, 3D modeling, Printing, Data modeling, 3D printing

Read Abstract +

Proceedings Article | 22 February 2021 Presentation + Paper

Better prediction on patterning failure mode with hotspot aware OPC modeling

Chih-I Wei, Stewart Wu, Yunfei Deng, Gurdaman Khaira, Ir Kusnadi, Germain Fenger, Seulki Kang, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns, Gian Lorusso

Proceedings Volume 11611, 1161112 (2021) https://doi.org/10.1117/12.2583837

KEYWORDS: Optical proximity correction, Electron beam lithography, 3D modeling, Inspection, Calibration, Lithography, Data modeling, Time metrology, Semiconducting wafers, Scanning electron microscopy

Read Abstract +

Proceedings Article | 20 March 2020 Presentation + Paper

Realizing more accurate OPC models by utilizing SEM contours

Chih-I Wei, Rajiv Sejpal, Yunfei Deng, Ir Kusnadi, Germain Fenger, Masahiro Oya, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns

Proceedings Volume 11325, 1132524 (2020) https://doi.org/10.1117/12.2554527

KEYWORDS: Scanning electron microscopy, Data modeling, Calibration, Optical proximity correction, Semiconducting wafers, Metrology, Image processing, 3D modeling, Photomasks, Image quality

Read Abstract +

Proceedings Article | 20 March 2018 Presentation + Paper

A model-based approach for the scattering-bar printing avoidance

Yaojun Du, Liang Li, Jingjing Zhang, Feng Shao, Christian Zuniga, Yunfei Deng

Proceedings Volume 10587, 105870Q (2018) https://doi.org/10.1117/12.2295451

KEYWORDS: Printing, Scattering, Data modeling, Optical proximity correction, Semiconducting wafers, Calibration, Binary data, Critical dimension metrology, Model-based design, Wafer-level optics

Read Abstract +

Proceedings Article | 24 March 2016 Paper

Modeling metrology for calibration of OPC models

Chris Mack, Ananthan Raghunathan, John Sturtevant, Yunfei Deng, Christian Zuniga, Kostas Adam

Proceedings Volume 9778, 97781Q (2016) https://doi.org/10.1117/12.2218534

KEYWORDS: Metrology, Optical proximity correction, Calibration, Data modeling, Photomasks, Lithography, 3D modeling, Electrons, Scanning electron microscopy, Semiconducting wafers, Monte Carlo methods

Read Abstract +

Proceedings Article | 18 March 2015 Paper

Resist profile modeling with compact resist model

Christian Zuniga, Yunfei Deng, Yuri Granik

Proceedings Volume 9426, 94261R (2015) https://doi.org/10.1117/12.2086468

KEYWORDS: 3D modeling, Diffusion, Cadmium, Calibration, Optical proximity correction, Convolution, Systems modeling, System on a chip, Etching, SRAF

Read Abstract +

Proceedings Article | 18 March 2015 Paper

Evaluation of compact models for negative-tone development layers at 20/14nm nodes

Ao Chen, Yee Mei Foong, Dong Qing Zhang, Hongxin Zhang, Angeline Chung, David Fryer, Yunfei Deng, Dmitry Medvedev, Yuri Granik

Proceedings Volume 9426, 94261P (2015) https://doi.org/10.1117/12.2085711

KEYWORDS: Data modeling, Calibration, Photomasks, Wafer-level optics, Performance modeling, Semiconducting wafers, Photoresist processing, Optical proximity correction, SRAF, 3D modeling

Read Abstract +

SPIE Journal Paper | 6 November 2014

Resist toploss and profile modeling for optical proximity correction applications

Christian Zuniga, Yunfei Deng

JM3, Vol. 13, Issue 04, 043010, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043010

KEYWORDS: Optical proximity correction, Calibration, Diffusion, Cadmium, 3D modeling, Semiconducting wafers, Critical dimension metrology, Photoresist processing, SRAF, Etching

Read Abstract +

Proceedings Article | 31 March 2014 Paper

Resist toploss modeling for OPC applications

Christian Zuniga, Yunfei Deng

Proceedings Volume 9052, 905227 (2014) https://doi.org/10.1117/12.2048124

KEYWORDS: Calibration, Diffusion, 3D modeling, Optical proximity correction, Cadmium, SRAF, Neodymium, Etching, Scanning electron microscopy, Critical dimension metrology

Read Abstract +

Proceedings Article | 8 November 2012 Paper

The significance of rigorous electromagnetic field simulation on mask development for 20nm optical lithography technology

Fan Jiang, Yunfei Deng, Jongwook Kye, Harry Levinson, Paul Ackmann, Byoung Choi, Frank Schurack, Martin Sczyrba

Proceedings Volume 8522, 852219 (2012) https://doi.org/10.1117/12.964292

KEYWORDS: Photomasks, Photovoltaics, Optical proximity correction, Lithography, Electromagnetism, SRAF, Optical lithography, Nanoimprint lithography, Diffraction, Printing

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Efficient multi-die placement for blank defect mitigation in EUV lithography

Yuelin Du, Hongbo Zhang, Martin D. F. Wong, Yunfei Deng, Rasit Topaloglu

Proceedings Volume 8322, 832231 (2012) https://doi.org/10.1117/12.918075

KEYWORDS: Algorithm development, Dysprosium, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Tolerancing, Lithography, Computer simulations, Reticles, Optical alignment

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Lithography target optimization with source-mask optimization

Yunfei Deng, Tamer Coskun, Jongwook Kye, Harry Levinson

Proceedings Volume 8326, 83262P (2012) https://doi.org/10.1117/12.918080

KEYWORDS: Lithography, Source mask optimization, Photomasks, Etching, Double patterning technology, Semiconducting wafers, Optical proximity correction, Optical lithography, Printing, Lithographic illumination

Read Abstract +

Proceedings Article | 6 April 2011 Paper

EUV OPC for 56nm metal pitch

Martin Burkhardt, Matt Colburn, Yunfei Deng, Emily Gallagher, Hirokazu Kato, Greg McIntyre, Karen Petrillo, Sudhar Raghunathan, Adam Smith, Tom Wallow, Obert Wood, Yi Zou, Christian Zuniga

Proceedings Volume 7969, 79690U (2011) https://doi.org/10.1117/12.879931

KEYWORDS: Photomasks, Optical proximity correction, Calibration, Back end of line, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Photoresist processing, Distortion

Read Abstract +

Proceedings Article | 5 April 2011 Paper

DPT restricted design rules for advanced logic applications

Yunfei Deng, Yuangsheng Ma, Hidekazu Yoshida, Jongwook Kye, Harry Levinson, Jason Sweis, Tamer Coskun, Vishnu Kamat

Proceedings Volume 7973, 79730H (2011) https://doi.org/10.1117/12.879793

KEYWORDS: Double patterning technology, Optical lithography, Lithography, Metals, Resolution enhancement technologies, Source mask optimization, Manufacturing, Logic, Immersion lithography, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 4 April 2011 Paper

Double patterning compliant logic design

Yuangsheng Ma, Jason Sweis, Chris Bencher, Yunfei Deng, Huixiong Dai, Hidekazu Yoshida, Bimal Gisuthan, Jongwook Kye, Harry Levinson

Proceedings Volume 7974, 79740D (2011) https://doi.org/10.1117/12.879846

KEYWORDS: Double patterning technology, Semiconducting wafers, Logic, Optical lithography, Etching, Metals, Back end of line, Neodymium, Standards development, Scanning electron microscopy

Read Abstract +

Proceedings Article | 3 April 2010 Paper

Decomposition strategies for self-aligned double patterning

Yuansheng Ma, Jason Sweis, Chris Bencher, Huixiong Dai, Yongmei Chen, Jason Cain, Yunfei Deng, Jongwook Kye, Harry Levinson

Proceedings Volume 7641, 76410T (2010) https://doi.org/10.1117/12.848387

KEYWORDS: Photomasks, Optical lithography, Etching, Dielectrics, Double patterning technology, Image processing, Logic, Scanning electron microscopy, Back end of line, Metals

Read Abstract +

Proceedings Article | 3 April 2010 Paper

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations in 32-nm node standard cell

Yongchan Ban, Yuansheng Ma, Harry Levinson, Yunfei Deng, Jongwook Kye, David Pan

Proceedings Volume 7641, 76410D (2010) https://doi.org/10.1117/12.846654

KEYWORDS: Resistance, Lithography, TCAD, Optical lithography, Line edge roughness, Critical dimension metrology, Manufacturing, Device simulation, Edge roughness, Optical proximity correction

Read Abstract +

Proceedings Article | 23 March 2010 Paper

EUV lithography at the 22nm technology node

Obert Wood, Chiew-Seng Koay, Karen Petrillo, Hiroyuki Mizuno, Sudhar Raghunathan, John Arnold, Dave Horak, Martin Burkhardt, Gregory McIntyre, Yunfei Deng, Bruno La Fontaine, Uzo Okoroanyanwu, Tom Wallow, Guillaume Landie, Theodorus Standaert, Sean Burns, Christopher Waskiewicz, Hirohisa Kawasaki, James H.-C. Chen, Matthew Colburn, Bala Haran, Susan S.-C. Fan, Yunpeng Yin, Christian Holfeld, Jens Techel, Jan-Hendrik Peters, Sander Bouten, Brian Lee, Bill Pierson, Bart Kessels, Robert Routh, Kevin Cummings

Proceedings Volume 7636, 76361M (2010) https://doi.org/10.1117/12.847049

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Immersion lithography, Double patterning technology, Optical proximity correction, Printing, Lithography, Optical lithography, Metals

Read Abstract +

Proceedings Article | 20 March 2010 Paper

Resist pattern prediction at EUV

John Biafore, Mark Smith, Eelco van Setten, Tom Wallow, Patrick Naulleau, David Blankenship, Stewart Robertson, Yunfei Deng

Proceedings Volume 7636, 76360R (2010) https://doi.org/10.1117/12.846535

KEYWORDS: Extreme ultraviolet, Line width roughness, Absorption, Ionization, Stochastic processes, Molecules, Scattering, Data modeling, Critical dimension metrology, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 11 March 2010 Paper

Considerations in source-mask optimization for logic applications

Yunfei Deng, Yi Zou, Kenji Yoshimoto, Yuansheng Ma, Cyrus Tabery, Jongwook Kye, Luigi Capodieci, Harry Levinson

Proceedings Volume 7640, 76401J (2010) https://doi.org/10.1117/12.848865

KEYWORDS: Source mask optimization, Lithography, Photomasks, Printing, Optimization (mathematics), Logic, Photoresist processing, Process modeling, 3D modeling, Optical lithography

Read Abstract +

Proceedings Article | 10 March 2010 Paper

Optimization on illumination source with design of experiments

Helen Hu, Yi Zou, Yunfei Deng

Proceedings Volume 7640, 764027 (2010) https://doi.org/10.1117/12.848876

KEYWORDS: Fiber optic illuminators, Diffractive optical elements, Remote sensing, Optimization (mathematics), Statistical analysis, Photomasks, Composites, Data modeling, Optical lithography, Manufacturing

Read Abstract +

Proceedings Article | 10 March 2010 Paper

Evaluation of lithographic benefits of using ILT techniques for 22nm-node

Yi Zou, Yunfei Deng, Jongwook Kye, Luigi Capodieci, Cyrus Tabery, Thuc Dam, Anthony Aadamov, Ki-Ho Baik, Linyong Pang, Bob Gleason

Proceedings Volume 7640, 76400L (2010) https://doi.org/10.1117/12.848479

KEYWORDS: Photomasks, Lithography, Source mask optimization, SRAF, Fiber optic illuminators, Metals, Optical proximity correction, Atrial fibrillation, Logic, Optimization (mathematics)

Read Abstract +

Proceedings Article | 11 December 2009 Paper

Pattern prediction in EUV resists

John Biafore, Mark Smith, Tom Wallow, Patrick Nalleau, David Blankenship, Yunfei Deng

Proceedings Volume 7520, 75201P (2009) https://doi.org/10.1117/12.836910

KEYWORDS: Extreme ultraviolet, Ionization, Absorption, Stochastic processes, Scattering, Line width roughness, Absorbance, Data modeling, Molecules, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection tools

Thomas Wallow, Bill Pierson, Hiroyuki Mizuno, Anita Fumar-Pici, Karen Petrillo, Chris Anderson, Patrick Naulleau, Steven Hansen, Yunfei Deng, Koen van Ingen Schenau, Chiew-Seng Koay, Linda Ohara, Sang-In Han, Robert Watso, Lior Huli, Martin Burkhardt, Obert Wood, Joerg Mallmann, Bart Kessels, Robert Routh, Kevin Cummings

Proceedings Volume 7273, 72733T (2009) https://doi.org/10.1117/12.814457

KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, Data modeling, Lithography, Diagnostics, Photoresist processing, Nanoimprint lithography, Diffusion, Reticles

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Exposure tool settings and OPC strategies for EUV lithography at the 16-nm node

Yunfei Deng, Jongwook Kye, Bruno La Fontaine, Tom Wallow, Obert Wood, Harry Levinson, Anita Fumar-Pici, Hiroyuki Mizuno, Chiew-seng Koay, Greg McIntyre

Proceedings Volume 7271, 727119 (2009) https://doi.org/10.1117/12.814953

KEYWORDS: Critical dimension metrology, Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, EUV optics, Diffusion, Lithographic illumination, Photomasks, Image processing, Semiconducting wafers

Read Abstract +

Proceedings Article | 18 March 2009 Open Access

Integration of EUV lithography in the fabrication of 22-nm node devices

Proceedings Volume 7271, 727104 (2009) https://doi.org/10.1117/12.814379

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Semiconducting wafers, Etching, Optical lithography, Photoresist processing, Lithography, Imaging systems, Copper

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 16 March 2009 Paper

Inverse vs. traditional OPC for the 22nm node

James Word, Yuri Granik, Marina Medvedeva, Sergei Rodin, Luigi Capodieci, Yunfei Deng, Jongwook Kye, Cyrus Tabery, Kenji Yoshimoto, Yi Zou, Hesham Diab, Mohamed Gheith, Mohamed Habib, Cynthia Zhu

Proceedings Volume 7274, 72743A (2009) https://doi.org/10.1117/12.814339

KEYWORDS: Optical proximity correction, Photomasks, Metals, Double patterning technology, Resolution enhancement technologies, Lithography, Manufacturing, Logic, Shape analysis, Visualization

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry

Aasutosh Dave, Oleg Kritsun, Yunfei Deng, Kenji Yoshimoto, Jie Li, Jiangtao Hu

Proceedings Volume 7274, 727415 (2009) https://doi.org/10.1117/12.814955

KEYWORDS: Data modeling, 3D modeling, Scatterometry, Calibration, Optical proximity correction, 3D metrology, Critical dimension metrology, Lithography, Line edge roughness, Cadmium

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Overcoming the challenges of 22-nm node patterning through litho-design co-optimization

Martin Burkhardt, J. C. Arnold, Z. Baum, S. Burns, J. Chang, J. Chen, J. Cho, V. Dai, Y. Deng, S. Halle, G. Han, S. Holmes, D. Horak, S. Kanakasabapathy, R. H. Kim, A. Klatchko, C. S. Koay, A. Krasnoperova, Y. Ma, E. McLellan, K. Petrillo, S. Schmitz, C. Tabery, Y. Yin, L. Zhuang, Y. Zou, J. Kye, V. Paruchuri, S. Mansfield, C. Spence, M. Colburn

Proceedings Volume 7274, 727404 (2009) https://doi.org/10.1117/12.814433

KEYWORDS: Etching, Lithography, Printing, Optical lithography, Double patterning technology, Resolution enhancement technologies, Logic, Metals, Photomasks, Tolerancing

Read Abstract +

Proceedings Article | 17 October 2008 Paper

An investigation of EUV lithography defectivity

Kevin Cummings, Thomas Laursen, Bill Pierson, Sang-in Han, Robert Watso, Youri van Dommelen, Brian Lee, Yunfei Deng, Bruno La Fontaine, Thomas Wallow, Uzo Okoroanyanwu, Obert Wood, Anna Tchikoulaeva, Christian Holfeld, Jan Hendrick Peters, Chiew-seng Koay, Karen Petrillo, Tony DiBiase, Sumanth Kini, Hiroyuki Mizuno

Proceedings Volume 7122, 71222G (2008) https://doi.org/10.1117/12.801528

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Inspection, Particles, Scanning electron microscopy, Wafer inspection, Defect inspection, Silicon

Read Abstract +

Proceedings Article | 26 March 2008 Paper

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Harry Levinson, Sarah McGowan, Uzodinma Okoroanyanwu, Rolf Seltmann, Cyrus Tabery, Anna Tchikoulaeva, Tom Wallow, Obert Wood, John Arnold, Don Canaperi, Matthew Colburn, Kurt Kimmel, Chiew-Seng Koay, Erin Mclellan, Dave Medeiros, Satyavolu Papa Rao, Karen Petrillo, Yunpeng Yin, Hiroyuki Mizuno, Sander Bouten, Michael Crouse, Andre van Dijk, Youri van Dommelen, Judy Galloway, Sang-In Han, Bart Kessels, Brian Lee, Sjoerd Lok, Brian Niekrewicz, Bill Pierson, Robert Routh, Emil Schmit-Weaver, Kevin Cummings, James Word

Proceedings Volume 6921, 69210P (2008) https://doi.org/10.1117/12.772933

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Transistors, Extreme ultraviolet, Optical proximity correction, Photoresist processing, Etching, Metals, Scanners

Read Abstract +

Proceedings Article | 22 March 2006 Paper

Demonstration of phase-shift masks for extreme-ultraviolet lithography

Bruno La Fontaine, Adam Pawloski, Obert Wood, Yunfei Deng, Harry Levinson, Patrick Naulleau, Paul Denham, Eric Gullikson, Brian Hoef, Christian Holfeld, Christian Chovino, Florian Letzkus

Proceedings Volume 6151, 61510A (2006) https://doi.org/10.1117/12.652212

KEYWORDS: Photomasks, Extreme ultraviolet, Reflectivity, Etching, Extreme ultraviolet lithography, Printing, Multilayers, Metrology, Scanning electron microscopy, Lithography

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Characterization, modeling, and impact of scattered light in low-k1 lithography

Bruno La Fontaine, Yunfei Deng, Mircea Dusa, Alden Acheta, Anita Fumar-Pici, Harish Bolla, Beverly Cheung, Bhanwar Singh, Harry Levinson

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601188

KEYWORDS: Modulation transfer functions, Scanners, Light scattering, Lithography, Spatial frequencies, Scatterometry, Critical dimension metrology, Computer simulations, Semiconducting wafers, Optical microscopes

Read Abstract +

Proceedings Article | 5 May 2005 Paper

Inspection of integrated circuit databases through reticle and wafer simulation: an integrated approach to design for manufacturing (DFM)

William Howard, Jaione Tirapu Azpiroz, Yalin Xiong, Chris Mack, Gaurav Verma, William Volk, Harold Lehon, Yunfei Deng, Rui-fang Shi, James Culp, Scott Mansfield

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.604698

KEYWORDS: Inspection, Semiconducting wafers, Reticles, Design for manufacturing, Scanning electron microscopy, Optical proximity correction, Lithography, Resolution enhancement technologies, Calibration, Defect detection

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors

Bruno La Fontaine, Adam Pawloski, Yunfei Deng, Christian Chovino, Laurent Dieu, Obert Wood, Harry Levinson

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.539074

KEYWORDS: Photomasks, Semiconducting wafers, Reflectors, Binary data, Extreme ultraviolet lithography, Multilayers, Critical dimension metrology, Reticles, Printing, Optical lithography

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Simulation of fine structures and defects in EUV etched multilayer masks

Yunfei Deng, Bruno La Fontaine, Adam Pawloski, Andrew Neureuther

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537229

KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Critical dimension metrology, Binary data, Multilayers, Optical lithography, Silicon, Refractive index, Near field

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Influence of antireflection coatings in ArF lithography

Bruno La Fontaine, Adam Pawloski, Alden Acheta, Yunfei Deng, Harry Levinson, Christopher Spence, Christian Chovino, Laurent Dieu, Eric Johnstone, Franklin Kalk

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518220

KEYWORDS: Reticles, Semiconducting wafers, Lithography, Modulation transfer functions, Reflectivity, Spatial frequencies, Critical dimension metrology, Chromium, Antireflective coatings, Scanners

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging

Yunfei Deng, Bruno La Fontaine, Harry Levinson, Andrew Neureuther

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484986

KEYWORDS: Photomasks, Extreme ultraviolet, Binary data, Multilayers, Extreme ultraviolet lithography, Optical lithography, Near field, Etching, Phase shifts, Chromium

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Performance of repaired defects and attPSM in EUV multilayer masks

Yunfei Deng, Bruno La Fontaine, Andrew Neureuther

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467896

KEYWORDS: Multilayers, Phase shifts, Extreme ultraviolet, Photomasks, Near field, Reflectivity, 3D modeling, Particles, Image quality, Electromagnetic simulation

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Simulation of exposure and alignment for nano-imprint lithography

Yunfei Deng, Andrew Neureuther

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472356

KEYWORDS: Metals, Polarization, Lithography, Refractive index, Binary data, Optical alignment, Chromium, Semiconducting wafers, Inspection, Silver

Read Abstract +

Proceedings Article | 1 July 2002 Paper

EUV phase-shifting masks and aberration monitors

Yunfei Deng, Andrew Neureuther

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472325

KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Monochromatic aberrations, Near field, Chromium, Extreme ultraviolet lithography, Lithography, Diffraction, Deep ultraviolet

Read Abstract +

Proceedings Article | 14 September 2001 Paper

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo Croffie, Yunfei Deng, Frank Gennari, Thomas Pistor, Garth Robins, Mike Williamson, Bo Wu, Lei Yuan, Andrew Neureuther

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435691

KEYWORDS: Printing, Java, Photomasks, Diffusion, Near field, Computer simulations, Optical simulations, Lithography, Human-machine interfaces, Etching

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Rigorous electromagnetic simulation applied to alignment systems

Yunfei Deng, Thomas Pistor, Andrew Neureuther

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435695

KEYWORDS: Optical alignment, Silicon, Nanoimprint lithography, Refractive index, Electromagnetic simulation, Diffraction, Semiconducting wafers, Wave propagation, Polarization, Analytical research

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Simulation of image quality issues at low k1 for 100-nm lithography

Andrew Neureuther, Konstantinos Adam, Shoji Hotta, Thomas Pistor, Garth Robins, Yunfei Deng

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438395

KEYWORDS: Photomasks, Monochromatic aberrations, Phase shifts, Lithography, Printing, Quartz, Image quality, Extreme ultraviolet, Spherical lenses, Near field

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Models for characterizing the printability of buried EUV defects

Yunfei Deng, Thomas Pistor, Andrew Neureuther

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436687

KEYWORDS: 3D modeling, Scattering, Extreme ultraviolet, Light scattering, Semiconducting wafers, Data modeling, Point spread functions, Photomasks, Radio propagation, Near field

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Simulation of EUV multilayer mirror buried defects

Matthew Brukman, Yunfei Deng, Andrew Neureuther

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390121

KEYWORDS: Mirrors, Ions, Etching, Semiconducting wafers, Extreme ultraviolet, Reflectivity, Sputter deposition, Extreme ultraviolet lithography, Photomasks, Electromagnetism

Read Abstract +

Showing 5 of 47 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years