Dr. Yunfei Deng Profile

Dr. Yunfei Deng

Staff Engineer at Mentor, a Siemens Business

SPIE Involvement:

Author

Publications (44)

Proceedings Article | 20 March 2020 Presentation + Paper

Realizing more accurate OPC models by utilizing SEM contours

Chih-I Wei, Rajiv Sejpal, Yunfei Deng, Ir Kusnadi, Germain Fenger, Masahiro Oya, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns

Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV

KEYWORDS: Metrology, Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 20 March 2018 Presentation + Paper

A model-based approach for the scattering-bar printing avoidance

Yaojun Du, Liang Li, Jingjing Zhang, Feng Shao, Christian Zuniga, Yunfei Deng

Proc. SPIE. 10587, Optical Microlithography XXXI

KEYWORDS: Wafer-level optics, Data modeling, Scattering, Calibration, Printing, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data, Model-based design

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Proceedings Article | 24 March 2016 Paper

Modeling metrology for calibration of OPC models

Chris Mack, Ananthan Raghunathan, John Sturtevant, Yunfei Deng, Christian Zuniga, Kostas Adam

Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

KEYWORDS: Lithography, Metrology, Data modeling, Calibration, Electrons, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Photomasks, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 18 March 2015 Paper

Evaluation of compact models for negative-tone development layers at 20/14nm nodes

Ao Chen, Yee Mei Foong, Dong Qing Zhang, Hongxin Zhang, Angeline Chung, David Fryer, Yunfei Deng, Dmitry Medvedev, Yuri Granik

Proc. SPIE. 9426, Optical Microlithography XXVIII

KEYWORDS: Wafer-level optics, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling

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Proceedings Article | 18 March 2015 Paper

Resist profile modeling with compact resist model

Christian Zuniga, Yunfei Deng, Yuri Granik

Proc. SPIE. 9426, Optical Microlithography XXVIII

KEYWORDS: Cadmium, Calibration, Etching, Diffusion, 3D modeling, Optical proximity correction, SRAF, Convolution, System on a chip, Systems modeling

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SPIE Journal Paper | 6 November 2014

Resist toploss and profile modeling for optical proximity correction applications

Christian Zuniga, Yunfei Deng

JM3 Vol. 13 Issue 04

KEYWORDS: Optical proximity correction, Calibration, Diffusion, Cadmium, 3D modeling, Semiconducting wafers, Critical dimension metrology, Photoresist processing, SRAF, Etching

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Proceedings Article | 31 March 2014 Paper

Resist toploss modeling for OPC applications

Christian Zuniga, Yunfei Deng

Proc. SPIE. 9052, Optical Microlithography XXVII

KEYWORDS: Cadmium, Calibration, Etching, Diffusion, 3D modeling, Scanning electron microscopy, Optical proximity correction, SRAF, Critical dimension metrology, Neodymium

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Proceedings Article | 8 November 2012 Paper

The significance of rigorous electromagnetic field simulation on mask development for 20nm optical lithography technology

Fan Jiang, Yunfei Deng, Jongwook Kye, Harry Levinson, Paul Ackmann, Byoung Choi, Frank Schurack, Martin Sczyrba

Proc. SPIE. 8522, Photomask Technology 2012

KEYWORDS: Lithography, Photovoltaics, Diffraction, Optical lithography, Printing, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Electromagnetism

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Proceedings Article | 23 March 2012 Paper

Efficient multi-die placement for blank defect mitigation in EUV lithography

Yuelin Du, Hongbo Zhang, Martin D. F. Wong, Yunfei Deng, Rasit Topaloglu

Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III

KEYWORDS: Lithography, Reticles, Computer simulations, Photomasks, Extreme ultraviolet, Dysprosium, Extreme ultraviolet lithography, Optical alignment, Algorithm development, Tolerancing

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Proceedings Article | 13 March 2012 Paper

Lithography target optimization with source-mask optimization

Yunfei Deng, Tamer Coskun, Jongwook Kye, Harry Levinson

Proc. SPIE. 8326, Optical Microlithography XXV

KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Etching, Printing, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 6 April 2011 Paper

EUV OPC for 56nm metal pitch

Martin Burkhardt, Matt Colburn, Yunfei Deng, Emily Gallagher, Hirokazu Kato, Greg McIntyre, Karen Petrillo, Sudhar Raghunathan, Adam Smith, Tom Wallow, Obert Wood, Yi Zou, Christian Zuniga

Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II

KEYWORDS: Calibration, Distortion, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Photoresist processing, Back end of line

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Proceedings Article | 5 April 2011 Paper

DPT restricted design rules for advanced logic applications

Yunfei Deng, Yuangsheng Ma, Hidekazu Yoshida, Jongwook Kye, Harry Levinson, Jason Sweis, Tamer Coskun, Vishnu Kamat

Proc. SPIE. 7973, Optical Microlithography XXIV

KEYWORDS: Lithography, Logic, Optical lithography, Metals, Manufacturing, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Source mask optimization, Resolution enhancement technologies

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Proceedings Article | 4 April 2011 Paper

Double patterning compliant logic design

Yuangsheng Ma, Jason Sweis, Chris Bencher, Yunfei Deng, Huixiong Dai, Hidekazu Yoshida, Bimal Gisuthan, Jongwook Kye, Harry Levinson

Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V

KEYWORDS: Logic, Optical lithography, Etching, Metals, Scanning electron microscopy, Double patterning technology, Neodymium, Semiconducting wafers, Standards development, Back end of line

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Proceedings Article | 3 April 2010 Paper

Decomposition strategies for self-aligned double patterning

Yuansheng Ma, Jason Sweis, Chris Bencher, Huixiong Dai, Yongmei Chen, Jason Cain, Yunfei Deng, Jongwook Kye, Harry Levinson

Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV

KEYWORDS: Logic, Optical lithography, Etching, Metals, Image processing, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Back end of line

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Proceedings Article | 3 April 2010 Paper

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations in 32-nm node standard cell

Yongchan Ban, Yuansheng Ma, Harry Levinson, Yunfei Deng, Jongwook Kye, David Pan

Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV

KEYWORDS: Lithography, Optical lithography, Manufacturing, Resistance, Optical proximity correction, Critical dimension metrology, Line edge roughness, TCAD, Device simulation, Edge roughness

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Proceedings Article | 23 March 2010 Paper

EUV lithography at the 22nm technology node

Obert Wood, Chiew-Seng Koay, Karen Petrillo, Hiroyuki Mizuno, Sudhar Raghunathan, John Arnold, Dave Horak, Martin Burkhardt, Gregory McIntyre, Yunfei Deng, Bruno La Fontaine, Uzo Okoroanyanwu, Tom Wallow, Guillaume Landie, Theodorus Standaert, Sean Burns, Christopher Waskiewicz, Hirohisa Kawasaki, James H.-C. Chen, Matthew Colburn, Bala Haran, Susan S.-C. Fan, Yunpeng Yin, Christian Holfeld, Jens Techel, Jan-Hendrik Peters, Sander Bouten, Brian Lee, Bill Pierson, Bart Kessels, Robert Routh, Kevin Cummings

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Lithography, Optical lithography, Metals, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Optical proximity correction

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Proceedings Article | 20 March 2010 Paper

Resist pattern prediction at EUV

John Biafore, Mark Smith, Eelco van Setten, Tom Wallow, Patrick Naulleau, David Blankenship, Stewart Robertson, Yunfei Deng

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Data modeling, Scattering, Molecules, Ionization, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes, Absorption

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Proceedings Article | 11 March 2010 Paper

Considerations in source-mask optimization for logic applications

Yunfei Deng, Yi Zou, Kenji Yoshimoto, Yuansheng Ma, Cyrus Tabery, Jongwook Kye, Luigi Capodieci, Harry Levinson

Proc. SPIE. 7640, Optical Microlithography XXIII

KEYWORDS: Lithography, Logic, Optical lithography, 3D modeling, Printing, Photomasks, Source mask optimization, Optimization (mathematics), Photoresist processing, Process modeling

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Proceedings Article | 10 March 2010 Paper

Evaluation of lithographic benefits of using ILT techniques for 22nm-node

Yi Zou, Yunfei Deng, Jongwook Kye, Luigi Capodieci, Cyrus Tabery, Thuc Dam, Anthony Aadamov, Ki-Ho Baik, Linyong Pang, Bob Gleason

Proc. SPIE. 7640, Optical Microlithography XXIII

KEYWORDS: Lithography, Logic, Atrial fibrillation, Metals, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Fiber optic illuminators

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Proceedings Article | 10 March 2010 Paper

Optimization on illumination source with design of experiments

Helen Hu, Yi Zou, Yunfei Deng

Proc. SPIE. 7640, Optical Microlithography XXIII

KEYWORDS: Optical lithography, Statistical analysis, Diffractive optical elements, Data modeling, Remote sensing, Composites, Manufacturing, Photomasks, Optimization (mathematics), Fiber optic illuminators

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Proceedings Article | 11 December 2009 Paper

Pattern prediction in EUV resists

John Biafore, Mark Smith, Tom Wallow, Patrick Nalleau, David Blankenship, Yunfei Deng

Proc. SPIE. 7520, Lithography Asia 2009

KEYWORDS: Data modeling, Scattering, Molecules, Ionization, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Stochastic processes, Absorption

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Proceedings Article | 1 April 2009 Paper

Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection tools

Thomas Wallow, Bill Pierson, Hiroyuki Mizuno, Anita Fumar-Pici, Karen Petrillo, Chris Anderson, Patrick Naulleau, Steven Hansen, Yunfei Deng, Koen van Ingen Schenau, Chiew-Seng Koay, Linda Ohara, Sang-In Han, Robert Watso, Lior Huli, Martin Burkhardt, Obert Wood, Joerg Mallmann, Bart Kessels, Robert Routh, Kevin Cummings

Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI

KEYWORDS: Lithography, Reticles, Data modeling, Diffusion, Diagnostics, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Photoresist processing

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Proceedings Article | 18 March 2009 Paper

Exposure tool settings and OPC strategies for EUV lithography at the 16-nm node

Yunfei Deng, Jongwook Kye, Bruno La Fontaine, Tom Wallow, Obert Wood, Harry Levinson, Anita Fumar-Pici, Hiroyuki Mizuno, Chiew-seng Koay, Greg McIntyre

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Lithographic illumination, Image processing, Diffusion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, EUV optics

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Proceedings Article | 18 March 2009

Integration of EUV lithography in the fabrication of 22-nm node devices

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Lithography, Optical lithography, Imaging systems, Etching, Copper, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

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Proceedings Article | 16 March 2009 Paper

Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry

Aasutosh Dave, Oleg Kritsun, Yunfei Deng, Kenji Yoshimoto, Jie Li, Jiangtao Hu

Proc. SPIE. 7274, Optical Microlithography XXII

KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, 3D modeling, Scatterometry, 3D metrology, Optical proximity correction, Critical dimension metrology, Line edge roughness

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Proceedings Article | 16 March 2009 Paper

Inverse vs. traditional OPC for the 22nm node

James Word, Yuri Granik, Marina Medvedeva, Sergei Rodin, Luigi Capodieci, Yunfei Deng, Jongwook Kye, Cyrus Tabery, Kenji Yoshimoto, Yi Zou, Hesham Diab, Mohamed Gheith, Mohamed Habib, Cynthia Zhu

Proc. SPIE. 7274, Optical Microlithography XXII

KEYWORDS: Lithography, Logic, Visualization, Metals, Manufacturing, Photomasks, Shape analysis, Double patterning technology, Optical proximity correction, Resolution enhancement technologies

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Proceedings Article | 16 March 2009 Paper

Overcoming the challenges of 22-nm node patterning through litho-design co-optimization

Martin Burkhardt, J. C. Arnold, Z. Baum, S. Burns, J. Chang, J. Chen, J. Cho, V. Dai, Y. Deng, S. Halle, G. Han, S. Holmes, D. Horak, S. Kanakasabapathy, R. H. Kim, A. Klatchko, C. S. Koay, A. Krasnoperova, Y. Ma, E. McLellan, K. Petrillo, S. Schmitz, C. Tabery, Y. Yin, L. Zhuang, Y. Zou, J. Kye, V. Paruchuri, S. Mansfield, C. Spence, M. Colburn

Proc. SPIE. 7274, Optical Microlithography XXII

KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Printing, Photomasks, Double patterning technology, Tolerancing, Resolution enhancement technologies

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Proceedings Article | 17 October 2008 Paper

An investigation of EUV lithography defectivity

Kevin Cummings, Thomas Laursen, Bill Pierson, Sang-in Han, Robert Watso, Youri van Dommelen, Brian Lee, Yunfei Deng, Bruno La Fontaine, Thomas Wallow, Uzo Okoroanyanwu, Obert Wood, Anna Tchikoulaeva, Christian Holfeld, Jan Hendrick Peters, Chiew-seng Koay, Karen Petrillo, Tony DiBiase, Sumanth Kini, Hiroyuki Mizuno

Proc. SPIE. 7122, Photomask Technology 2008

KEYWORDS: Reticles, Particles, Silicon, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

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Proceedings Article | 26 March 2008 Paper

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Harry Levinson, Sarah McGowan, Uzodinma Okoroanyanwu, Rolf Seltmann, Cyrus Tabery, Anna Tchikoulaeva, Tom Wallow, Obert Wood, John Arnold, Don Canaperi, Matthew Colburn, Kurt Kimmel, Chiew-Seng Koay, Erin Mclellan, Dave Medeiros, Satyavolu Papa Rao, Karen Petrillo, Yunpeng Yin, Hiroyuki Mizuno, Sander Bouten, Michael Crouse, Andre van Dijk, Youri van Dommelen, Judy Galloway, Sang-In Han, Bart Kessels, Brian Lee, Sjoerd Lok, Brian Niekrewicz, Bill Pierson, Robert Routh, Emil Schmit-Weaver, Kevin Cummings, James Word

Proc. SPIE. 6921, Emerging Lithographic Technologies XII

KEYWORDS: Etching, Metals, Scanners, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

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Proceedings Article | 22 March 2006 Paper

Demonstration of phase-shift masks for extreme-ultraviolet lithography

Bruno La Fontaine, Adam Pawloski, Obert Wood, Yunfei Deng, Harry Levinson, Patrick Naulleau, Paul Denham, Eric Gullikson, Brian Hoef, Christian Holfeld, Christian Chovino, Florian Letzkus

Proc. SPIE. 6151, Emerging Lithographic Technologies X

KEYWORDS: Lithography, Multilayers, Metrology, Etching, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

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Proceedings Article | 12 May 2005 Paper

Characterization, modeling, and impact of scattered light in low-k1 lithography

Bruno La Fontaine, Yunfei Deng, Mircea Dusa, Alden Acheta, Anita Fumar-Pici, Harish Bolla, Beverly Cheung, Bhanwar Singh, Harry Levinson

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Lithography, Optical microscopes, Spatial frequencies, Scanners, Light scattering, Computer simulations, Scatterometry, Modulation transfer functions, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 5 May 2005 Paper

Inspection of integrated circuit databases through reticle and wafer simulation: an integrated approach to design for manufacturing (DFM)

William Howard, Jaione Tirapu Azpiroz, Yalin Xiong, Chris Mack, Gaurav Verma, William Volk, Harold Lehon, Yunfei Deng, Rui-fang Shi, James Culp, Scott Mansfield

Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III

KEYWORDS: Lithography, Reticles, Defect detection, Calibration, Inspection, Scanning electron microscopy, Design for manufacturing, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

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Proceedings Article | 20 May 2004 Paper

Simulation of fine structures and defects in EUV etched multilayer masks

Yunfei Deng, Bruno La Fontaine, Adam Pawloski, Andrew Neureuther

Proc. SPIE. 5374, Emerging Lithographic Technologies VIII

KEYWORDS: Refractive index, Multilayers, Optical lithography, Etching, Silicon, Near field, Photomasks, Extreme ultraviolet, Critical dimension metrology, Binary data

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Proceedings Article | 20 May 2004 Paper

Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors

Bruno La Fontaine, Adam Pawloski, Yunfei Deng, Christian Chovino, Laurent Dieu, Obert Wood, Harry Levinson

Proc. SPIE. 5374, Emerging Lithographic Technologies VIII

KEYWORDS: Reflectors, Multilayers, Reticles, Optical lithography, Printing, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Binary data

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Proceedings Article | 17 December 2003 Paper

Influence of antireflection coatings in ArF lithography

Bruno La Fontaine, Adam Pawloski, Alden Acheta, Yunfei Deng, Harry Levinson, Christopher Spence, Christian Chovino, Laurent Dieu, Eric Johnstone, Franklin Kalk

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Antireflective coatings, Reticles, Spatial frequencies, Scanners, Reflectivity, Chromium, Modulation transfer functions, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 16 June 2003 Paper

Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging

Yunfei Deng, Bruno La Fontaine, Harry Levinson, Andrew Neureuther

Proc. SPIE. 5037, Emerging Lithographic Technologies VII

KEYWORDS: Multilayers, Optical lithography, Etching, Chromium, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Binary data, Phase shifts

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Proceedings Article | 27 December 2002 Paper

Performance of repaired defects and attPSM in EUV multilayer masks

Yunfei Deng, Bruno La Fontaine, Andrew Neureuther

Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Multilayers, Particles, Reflectivity, 3D modeling, Image quality, Near field, Photomasks, Extreme ultraviolet, Electromagnetic simulation, Phase shifts

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Proceedings Article | 1 July 2002 Paper

Simulation of exposure and alignment for nano-imprint lithography

Yunfei Deng, Andrew Neureuther

Proc. SPIE. 4688, Emerging Lithographic Technologies VI

KEYWORDS: Lithography, Refractive index, Polarization, Metals, Silver, Inspection, Chromium, Optical alignment, Semiconducting wafers, Binary data

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Proceedings Article | 1 July 2002 Paper

EUV phase-shifting masks and aberration monitors

Yunfei Deng, Andrew Neureuther

Proc. SPIE. 4688, Emerging Lithographic Technologies VI

KEYWORDS: Lithography, Diffraction, Monochromatic aberrations, Deep ultraviolet, Chromium, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

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Proceedings Article | 14 September 2001 Paper

Rigorous electromagnetic simulation applied to alignment systems

Yunfei Deng, Thomas Pistor, Andrew Neureuther

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Diffraction, Refractive index, Polarization, Silicon, Wave propagation, Nanoimprint lithography, Optical alignment, Analytical research, Semiconducting wafers, Electromagnetic simulation

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Proceedings Article | 14 September 2001 Paper

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo Croffie, Yunfei Deng, Frank Gennari, Thomas Pistor, Garth Robins, Mike Williamson, Bo Wu, Lei Yuan, Andrew Neureuther

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Human-machine interfaces, Lithography, Etching, Diffusion, Computer simulations, Printing, Near field, Java, Photomasks, Optical simulations

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Proceedings Article | 5 September 2001 Paper

Simulation of image quality issues at low k1 for 100-nm lithography

Andrew Neureuther, Konstantinos Adam, Shoji Hotta, Thomas Pistor, Garth Robins, Yunfei Deng

Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII

KEYWORDS: Lithography, Monochromatic aberrations, Quartz, Printing, Image quality, Near field, Photomasks, Extreme ultraviolet, Spherical lenses, Phase shifts

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Proceedings Article | 20 August 2001 Paper

Models for characterizing the printability of buried EUV defects

Yunfei Deng, Thomas Pistor, Andrew Neureuther

Proc. SPIE. 4343, Emerging Lithographic Technologies V

KEYWORDS: Point spread functions, Data modeling, Scattering, Light scattering, 3D modeling, Near field, Photomasks, Extreme ultraviolet, Semiconducting wafers, Radio propagation

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Proceedings Article | 21 July 2000 Paper

Simulation of EUV multilayer mirror buried defects

Matthew Brukman, Yunfei Deng, Andrew Neureuther

Proc. SPIE. 3997, Emerging Lithographic Technologies IV

KEYWORDS: Mirrors, Etching, Sputter deposition, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Electromagnetism

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Showing 5 of 44 publications

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