Dr. Yusuke Teramoto Profile

Dr. Yusuke Teramoto

R&D Unit 1 Leader at Ushio Germany GmbH

SPIE Involvement:

Author

Publications (23)

Proceedings Article | 13 November 2024 Poster

Poster

LDP EUV source performance and cost-of-ownership improvement

Yusuke Teramoto, Shunichi Morimoto, Teruaki Kawajiri, Koji Suzuki, Fuki Sato, Akihisa Nagano, Noritaka Ashizawa, Hidenori Watanabe, Kazuya Aoki, Yoshihiko Sato

Proceedings Volume PC13215, PC1321514 (2024) https://doi.org/10.1117/12.3036726

KEYWORDS: Extreme ultraviolet, Tunable filters, Plasma, Inspection, Extreme ultraviolet lithography, Tin, Reliability, Pulsed laser operation, Ions, EUV optics

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Proceedings Article | 21 November 2023 Paper

Paper

High-brightness LDP source

Masataka Mamizuka, Teruaki Kawajiri, Koji Suzuki, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Akihisa Nagano, Daisuke Yajima, Noritaka Ashizawa, Kazuya Aoki, Yoshihiko Sato

Proceedings Volume 12750, 1275012 (2023) https://doi.org/10.1117/12.2687785

KEYWORDS: Plasma, Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Reliability, Light sources, Electrodes

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Proceedings Article | 29 September 2023 Paper

Paper

High-brightness LDP source

Kazuya Aoki, Yoshihiko Sato, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Akihisa Nagano, Daisuke Yajima, Noritaka Ashizawa

Proceedings Volume 12915, 1291509 (2023) https://doi.org/10.1117/12.2688117

KEYWORDS: Extreme ultraviolet, Plasma, Tin, Extreme ultraviolet lithography, Inspection, Reliability, Plasma generation, Semiconductors, Light sources, Ions

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Proceedings Article | 26 May 2023 Presentation + Paper

Presentation + Paper

Improvement of LDP EUV source performance for actinic patterned mask inspection

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Bárbara Santos, Akihisa Nagano, Noritaka Ashizawa, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Kazuya Aoki, Yoshihiko Sato

Proceedings Volume PC12494, PC124940E (2023) https://doi.org/10.1117/12.2671128

KEYWORDS: Extreme ultraviolet, Plasma, Tin, Inspection, Electrodes, Laser irradiation, Vacuum chambers, Reliability, Ions, Pulsed laser operation

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Proceedings Article | 1 December 2022 Presentation + Paper

Presentation + Paper

High-brightness LDP source for EUVL mask inspection

Ryuta Furuya, Kazuya Aoki, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hirdenori Watanabe, Akihisa Nagano, Daisuke Yajima, Noritaka Ashizawa, Yoshihiko Sato

Proceedings Volume 12292, 122920G (2022) https://doi.org/10.1117/12.2641777

KEYWORDS: Plasma, Extreme ultraviolet, Electrodes, Inspection, Photomasks, Light sources, Extreme ultraviolet lithography, Ions, Cameras, Laser irradiation

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Proceedings Article | 16 September 2022 Paper

Paper

High-brightness LDP source for EUVL mask inspection

Kazuya Aoki, Yoshihiko Sato, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Akihisa Nagano, Daisuke Yajima, Noritaka Ashizawa

Proceedings Volume 12325, 123250I (2022) https://doi.org/10.1117/12.2642210

KEYWORDS: Extreme ultraviolet, Plasma, Inspection, Extreme ultraviolet lithography, Photomasks, Ions, Tin, Reliability, Plasma generation, Light sources

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Proceedings Article | 30 September 2021 Presentation

Presentation

High-brightness LDP EUV source for EUV mask inspection

Noritaka Ashizawa, Yoshihiko Sato, Hidenori Watanabe, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hironobu Yabuya, Kazuya Aoki, Daisuke Yajima, Akihisa Nagano

Proceedings Volume 11854, 118540L (2021) https://doi.org/10.1117/12.2600974

KEYWORDS: Extreme ultraviolet, Inspection, Plasma, Reliability, Tin, Light sources, Laser development, Extreme ultraviolet lithography, Electrodes

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Proceedings Article | 23 August 2021 Paper

Paper

High-brightness LDP source for EUVL mask inspection

Kazuya Aoki, Yoshihiko Sato, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe

Proceedings Volume 11908, 119080I (2021) https://doi.org/10.1117/12.2601995

KEYWORDS: Extreme ultraviolet, Plasma, Tin, Inspection, Light sources, Photomasks, Extreme ultraviolet lithography, Semiconductors, Reliability

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Proceedings Article | 23 March 2021 Presentation + Paper

Presentation + Paper

Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Yoshihiko Sato, Kazuya Aoki, Ted Liang, Yoshihiro Tezuka, Marieke Jager, Firoz Ghadiali, Frank Abboud, Steven Carson

Proceedings Volume 11609, 116090L (2021) https://doi.org/10.1117/12.2588788

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Proceedings Article | 5 May 2017 Presentation

Presentation

High-radiance LDP source for mask inspection and beam line applications (Conference Presentation)

Yusuke Teramoto, Bárbara Santos, Guido Mertens, Ralf Kops, Margarete Kops, Alexander von Wezyk, Klaus Bergmann, Hironobu Yabuta, Akihisa Nagano, Noritaka Ashizawa, Yuta Taniguchi, Daiki Yamatani, Takahiro Shirai, Kunihiko Kasama

Proceedings Volume 10143, 101431L (2017) https://doi.org/10.1117/12.2258139

KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Laser development, Plasma, Reliability, Photomasks, Extreme ultraviolet lithography, Ruthenium, Sputter deposition

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Proceedings Article | 18 March 2016 Paper

Paper

High-radiance LDP source: clean, reliable, and stable EUV source for mask inspection

Yusuke Teramoto, Bárbara Santos, Guido Mertens, Ralf Kops, Margarete Kops, Alexander von Wezyk, Klaus Bergmann, Hironobu Yabuta, Akihisa Nagano, Noritaka Ashizawa, Yuta Taniguchi, Takahiro Shirai, Kiyotada Nakamura, Kazuya Aoki, Kunihiko Kasama

Proceedings Volume 9776, 97760L (2016) https://doi.org/10.1117/12.2219219

KEYWORDS: Extreme ultraviolet, Ruthenium, Tin, Plasma, Inspection, Extreme ultraviolet lithography, Reliability, Photomasks, Ions, Mirrors

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High-throughput and -resolution actinic mask inspection tools are needed as EUVL begins to enter into volume production phase. To realize such inspection tools, a high-radiance EUV source is necessary. Ushio’s laser-assisted discharge-produced plasma (LDP) source is able to meet industry’s requirements in radiance, cleanliness, stability and reliability. Ushio’s LDP source has shown the peak radiance at plasma of 180 W/mm²/sr and the area-averaged radiance in a 200-μm-diameter circle behind the debris mitigation system of 120 W/mm²/sr. A new version of the debris mitigation system is in testing phase. Its optical transmission was confirmed to be 73 %, which is 4 % lower than that of the previous version and therefore will be improved. Cleanliness of the system is evaluated by exposing Ru mirrors placed behind the debris mitigation system. Ru sputter rate was proven to be sufficiently low as 3~5 nm/Gpulse at 7 kHz, whereas frequency-dependent sputter rate was 1~3 nm/Gpulse at 5~9 kHz as previously reported. Sn deposition remained very low (< 0.05 nm) and did not grow over time. A new technique to suppress debris was tested and preliminary results were promising. Time-of-flight signal of fast ions was completely suppressed and Ru sputter rate of exposed mirrors at 3 kHz was approximately 1.3 nm/Gpulse, whereas the conventional mitigation system (new version) resulted in Ru sputter rate of 0.7 nm/Gpulse. This new technique also allows increasing the radiance efficiency by 30 %. Stability tests were done at several different discharge frequencies. Pulse energy stability was approximately 10 %. Dose energy stability dropped from approximately 2 % to 0.1 % when feedback control was activated. EUV emission position stability was studied at 3 kHz. Deviation of the plasma center of gravity was 6 μm, which is 3 % of plasma diameter and therefore considered to be negligible. Reliability tests were performed on both R and D and prototype machines and up to 200 hours of non-interrupted operation was demonstrated.

Proceedings Article | 19 March 2015 Paper

Paper

High-radiance LDP source for mask-inspection application

Yusuke Teramoto, Bárbara Santos, Guido Mertens, Ralf Kops, Margarete Kops, Alexander von Wezyk, Hironobu Yabuta, Akihisa Nagano, Takahiro Shirai, Noritaka Ashizawa, Kiyotada Nakamura, Kunihiko Kasama

Proceedings Volume 9422, 94220F (2015) https://doi.org/10.1117/12.2086606

KEYWORDS: Extreme ultraviolet, Inspection, Photomasks, Plasma, Tin, Reliability, Lithography, Feedback control, Ruthenium, Extreme ultraviolet lithography

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Proceedings Article | 17 April 2014 Paper

Paper

High-radiance LDP source for mask inspection application

Yusuke Teramoto, Bárbara Santos, Guido Mertens, Ralf Kops, Margarete Kops, Felix Küpper, Gota Niimi, Hironobu Yabuta, Akihisa Nagano, Takuma Yokoyama, Masaki Yoshioka, Takahiro Shirai, Noritaka Ashizawa, Hiroto Sato, Kiyotada Nakamura, Kunihiko Kasama

Proceedings Volume 9048, 904813 (2014) https://doi.org/10.1117/12.2046423

KEYWORDS: Extreme ultraviolet, Inspection, Photomasks, Plasma, Tin, Laser stabilization, Reliability, Extreme ultraviolet lithography, Electrodes, Lithography

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Proceedings Article | 8 April 2011 Paper

Paper

Sn film and ignition control for performance enhancement of laser-triggered DPP source

Yusuke Teramoto, Takuma Yokoyama, Hideyuki Urakami, Kazuaki Hotta

Proceedings Volume 7969, 79692V (2011) https://doi.org/10.1117/12.879512

KEYWORDS: Tin, Ions, Electrodes, Extreme ultraviolet, Plasma, Liquids, Particles, Extreme ultraviolet lithography, Laser development, Atmospheric particles

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Proceedings Article | 8 April 2011 Paper

Paper

Development of debris-mitigation tool for HVM DPP source

Hironobu Yabuta, Shinsuke Mori, Takahiro Inoue, Yusuke Teramoto, Hiroto Sato, Kazuaki Hotta

Proceedings Volume 7969, 79692U (2011) https://doi.org/10.1117/12.879471

KEYWORDS: Tin, Ruthenium, Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Sputter deposition, Mirrors, Scanners, Contamination, Particles

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Proceedings Article | 7 April 2011 Paper

Paper

Tin LDP source collector module (SoCoMo) ready for integration into Beta scanner

Masaki Yoshioka, Yusuke Teramoto, Jeroen Jonkers, Max Schürmann, Rolf Apetz, Volker Kilian, Marc Corthout

Proceedings Volume 7969, 79691G (2011) https://doi.org/10.1117/12.879386

KEYWORDS: Tin, Scanners, Plasma, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Light sources, High volume manufacturing, Laser applications, Semiconductors

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As the traditional techniques used in optical photolithography at 193 nm are running out of steam and are becoming prohibitively expensive, a new cost-effective, high power EUV (extreme ultra-violet) light source is needed to enable high volume manufacturing (HVM) of ever shrinking semiconductor devices. XTREME technologies GmbH and EUVA have jointly developed tin based LDP (Laser assisted Discharge Plasma) source systems during the last two years for the integration of such sources into scanners of the latest and future generations. The goals of the consortium are 1) to solve the wavelength gap - the growing gap between the printed critical dimensions (CD) driven by Moore's Law and the printing capability of lithographic exposure tools constrained by the wavelength of the light source - and 2) to enable the timely availability of EUV light sources for high volume manufacturing. A first Beta EUV Source Collector Module (SoCoMo) containing a tin based laser assisted discharge plasma source is in operation at XTREME technologies since September 2009. Alongside the power increase, the main focus of work emphasizes on the improvement of uptime and reliability of the system leveraging years of experience with the Alpha sources. Over the past period, a cumulated EUV dose of several hundreds of Mega Joules of EUV light has been generated at the intermediate focus, capable to expose more than a hundred thousand wafers with the right dose stability to create well-yielding transistors. During the last months, the entire system achieved an uptime - calculated according to the SEMI standards - of up to 80 %. This new SoCoMo has been successfully integrated and tested with a pre-production scanner and is now ready for first wafer exposures at a customer's site. In this paper we will emphasize what our innovative concept is against old type of Xe DPP and we will present the recent status of this system like power level, uptime and lifetime of components as well. In the second part of the paper the EUV source developments for the HVM phase are described. The basic engineering challenges are thermal scaling of the source and debris mitigation. Feasibility of the performance can be demonstrated by experimental results after the implementation into the beta system. The feasibility of further efficiency improvement, required for the HVM phase, will also be shown. The objectives of the HVM roadmap will be achieved through evolutionary steps from the current Beta products.

Proceedings Article | 20 March 2010 Paper

Paper

Tin DPP source collector module (SoCoMo): status of Beta products and HVM developments

Masaki Yoshioka, Yusuke Teramoto, Peter Zink, Guido Schriever, Gota Niimi, Marc Corthout

Proceedings Volume 7636, 763610 (2010) https://doi.org/10.1117/12.846545

KEYWORDS: Extreme ultraviolet, Tin, Scanners, Extreme ultraviolet lithography, Plasma, Ultraviolet radiation, Reliability, Semiconducting wafers, Lithography, Electrodes

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Proceedings Article | 18 March 2009 Paper

Paper

Dependence of laser parameter on conversion efficiency in high-repetition-rate laser-ablation-discharge EUV source

Yusuke Teramoto, Takuma Yokoyama, Hiroshi Mizokoshi, Hiroto Sato, Kazuaki Hotta

Proceedings Volume 7271, 727139 (2009) https://doi.org/10.1117/12.814460

KEYWORDS: Plasma, Extreme ultraviolet, Pulsed laser operation, Electrodes, Laser irradiation, Pulsed power, Reliability, Tin, Extreme ultraviolet lithography, Plasma diagnostics

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Proceedings Article | 21 March 2007 Paper

Paper

Development of Sn-fueled high-power DPP EUV source for enabling HVM

Yusuke Teramoto, Zenzo Narihiro, Daiki Yamatani, Takuma Yokoyama, Kazunori Bessho, Yuki Joshima, Takahiro Shirai, Shinsuke Mouri, Takahiro Inoue, Hiroshi Mizokoshi, Gohta Niimi, Tomonao Hosokai, Hironobu Yabuta, Kohkan Paul, Tetsu Takemura, Toshio Yokota, Kiyoyuki Kabuki, Koji Miyauchi, Kazuaki Hotta, Hiroto Sato

Proceedings Volume 6517, 65173R (2007) https://doi.org/10.1117/12.728711

KEYWORDS: Plasma, Tin, Extreme ultraviolet, Electrodes, Mirrors, Ruthenium, Reflectivity, Xenon, Magnetism, Halogens

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Proceedings Article | 24 March 2006 Paper

Paper

Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM

Yusuke Teramoto, Gohta Niimi, Daiki Yamatani, Yuki Joshima, Kazunori Bessho, Takahiro Shirai, Tetsu Takemura, Toshio Yokota, Hironobu Yabuta, Khokan Paul, Kiyoyuki Kabuki, Koji Miyauchi, Mitsuru Ikeuchi, Kazuaki Hotta, Masaki Yoshioka, Hiroto Sato

Proceedings Volume 6151, 615147 (2006) https://doi.org/10.1117/12.657272

KEYWORDS: Plasma, Extreme ultraviolet, Xenon, Tin, Head, Extreme ultraviolet lithography, Magnetism, Electrodes, Capillaries, Capacitors

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Proceedings Article | 6 May 2005 Paper

Paper

High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma

Yusuke Teramoto, Hiroto Sato, Kazunori Bessho, Gohta Niimi, Takahiro Shirai, Daiki Yamatani, Tetsu Takemura, Toshio Yokota, Khokan Paul, Kiyoyuki Kabuki, Koji Miyauchi, Mitsuru Ikeuchi, Kazuaki Hotta, Masaki Yoshioka, Koichi Toyoda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.602021

KEYWORDS: Extreme ultraviolet, Plasma, Capillaries, Mirrors, Xenon, Head, Reflectivity, Magnetism, Solids, Diagnostics

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Proceedings Article | 20 May 2004 Paper

Paper

High-repetition-rate MPC generator-driven capillary Z-pinch EUV source

Yusuke Teramoto, Hiroto Sato, Kazunori Bessho, Takahiro Shirai, Daiki Yamatani, Tetsu Takemura, Toshio Yokota, Kohkan Paul, Kiyoyuki Kabuki, Koji Miyauchi, Mitsuru Ikeuchi, Keisuke Okubo, Kazuaki Hotta, Masaki Yoshioka, Koichi Toyoda

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536036

KEYWORDS: Extreme ultraviolet, Capillaries, Plasma, Mirrors, Xenon, Head, Magnetism, Electrodes, Solids, Diagnostics

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Proceedings Article | 16 June 2003 Paper

Paper

Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography

Yusuke Teramoto, Hiroto Sato, Kazunori Bessho, Koji Miyauchi, Mitsuru Ikeuchi, Keisuke Okubo, Masaki Yoshioka, Koichi Toyoda

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483704

KEYWORDS: Extreme ultraviolet, Plasma, Capillaries, Protactinium, Xenon, Extreme ultraviolet lithography, Lithography, Magnetism, Solids, Photodiodes

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Showing 5 of 23 publications

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