Mr. Yuya Kamei Profile

Yuya Kamei

at Tokyo Electron Kyushu Ltd

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 1 May 2023 Poster + Paper

Poster + Paper

Establishment of new process technology for EUV lithography

Yuhei Kuwahara, Shinichiro Kawakami, Kanzo Kato, Soichiro Okada, Yuya Kamei, Tomoya Onitsuka, Takashi Yamauchi, Nanoka Miyahara, Congque Dinh, Lior Huli, Satoru Shimura

Proceedings Volume 12498, 124981F (2023) https://doi.org/10.1117/12.2657076

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Etching, Solubility, High volume manufacturing, Silicon carbide, Silicon, Scanning electron microscopy

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Proceedings Article | 11 November 2022 Presentation

Presentation

Holistic litho-etch development to address patterning challenges towards high NA EUV

Seiji Nagahara, Arnaud Dauendorffer, Xiang Liu, Tomoya Onitsuka, Hisashi Genjima, Noriaki Nagamine, Yuhei Kuwahara, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Sophie Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, Eric Liu, Christopher Catano, Joshua LaRose, Jeffrey Shearer, Lior Huli, Philippe Foubert, Danilo De Simone

Proceedings Volume PC12292, PC122920N (2022) https://doi.org/10.1117/12.2642941

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Etching, Plasma etching, Lithography, Yield improvement, Stochastic processes, Plasma, Photoresist materials

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Proceedings Article | 25 May 2022 Poster + Paper

Poster + Paper

Metal oxide resist (MOR) EUV lithography processes for DRAM application

Shinichiro Kawakami, Tomoya Onitsuka, Yuya Kamei, Satoru Shimura, Chan Ha Park, Sang Ho Lee, Hong Goo Lee, Jae Wook Seo, Jin il Kim, Jun ho Roh, Jin Hyung Kim, Ki Lyoung Lee, Seiji Nagahara, Jeoung Yun Kim, Jang Hwan Kim, Shingo Inaba, Jong Eun Park

Proceedings Volume 12055, 120550N (2022) https://doi.org/10.1117/12.2613974

KEYWORDS: Metals, Contamination, Semiconducting wafers, Optical lithography, Extreme ultraviolet lithography, Contamination control, Coating, Bridges, Manufacturing, Oxides

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Proceedings Article | 25 May 2022 Poster + Paper

Poster + Paper

Novel technologies in coater/developer to improve the defectivity for advanced EUV patterning materials

Yuya Kamei, Tomoya Onitsuka, Takashi Yamauchi, Takahiro Shiozawa, Yuhei Kuwahara, Shinichiro Kawakami, Seiji Fujimoto, Arisa Hara, Satoru Shimura

Proceedings Volume 12055, 120550O (2022) https://doi.org/10.1117/12.2613643

KEYWORDS: Particles, Bridges, Etching, Semiconducting wafers, Metals, Extreme ultraviolet, Silicon carbide, Photoresist processing, Optical lithography, Lithography

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Proceedings Article | 28 September 2021 Presentation

Presentation

Addressing EUV patterning challenges towards the limits of NA 0.33 EUV exposure

Arnaud Dauendorffer, Tomoya Onitsuka, Hiroki Tadatomo, Keisuke Yoshida, Takahiro Shiozawa, Hisashi Genjima, Noriaki Nagamine, Yuya Kamei, Soichiro Okada, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Congque Dinh, Luka Kljucar, Danilo De Simone, Philippe Foubert

Proceedings Volume 11854, 118540B (2021) https://doi.org/10.1117/12.2600860

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Metals, Etching, Stochastic processes, Semiconductors, Semiconductor manufacturing, Resistance, Photomasks, Particles

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Proceedings Article | 23 March 2020 Paper

Paper

CLEAN TRACK solutions for defectivity and CD control towards 5 nm and smaller nodes

Arnaud Dauendorffer, Takahiro Shiozawa, Keisuke Yoshida, Noriaki Nagamine, Yuya Kamei, Shinichiro Kawakami, Satoru Shimura, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 11323, 113232A (2020) https://doi.org/10.1117/12.2551627

KEYWORDS: Photoresist materials, Critical dimension metrology, Etching, Extreme ultraviolet lithography, Bridges, Extreme ultraviolet, Stochastic processes, Semiconducting wafers, Photoresist processing

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Proceedings Article | 7 October 2019 Paper

Paper

New coater/developer technologies for CD control and defectivity reduction towards 5 nm and smaller nodes

Arnaud Dauendorffer, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 11147, 111471N (2019) https://doi.org/10.1117/12.2536470

KEYWORDS: Critical dimension metrology, Bridges, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes, Inspection, Extreme ultraviolet, Scanners, Lithography, Silicon

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Proceedings Article | 8 April 2019 Paper

Paper

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Seiji Nagahara, Cong Que Dinh, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yoshihiro Kondo, Michael Carcasi, Yukie Minekawa, Hiroyuki Ide, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Serge Biesemans, Hideo Nakashima, Danilo De Simone, John Petersen, Philippe Foubert, Peter De Bisschop, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 10960, 109600A (2019) https://doi.org/10.1117/12.2515187

KEYWORDS: Stochastic processes, Calibration, Extreme ultraviolet, Line edge roughness, 3D modeling, Extreme ultraviolet lithography, Switching

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Proceedings Article | 26 March 2019 Paper

Paper

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

Yuya Kamei, Yohei Sano, Takashi Yamauchi, Shinichiro Kawakami, Masahide Tadokoro, Masashi Enomoto, Makoto Muramatsu, Kathleen Nafus, Akihiro Sonoda, Marc Demand, Philippe Foubert

Proceedings Volume 10957, 109571P (2019) https://doi.org/10.1117/12.2514930

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Particles, Stochastic processes, Coating, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet

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Proceedings Article | 26 March 2019 Paper

Paper

Calibrated PSCAR stochastic simulation

Cong Que Dinh, Seiji Nagahara, Gousuke Shiraishi, Yukie Minekawa, Yuya Kamei, Michael Carcasi, Hiroyuki Ide, Yoshihiro Kondo, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Teruhiko Moriya, Kazuhiro Takeshita, Kathleen Nafus, Serge Biesemans, John Petersen, Danilo De Simone, Philippe Foubert, Peter De Bisschop, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 10957, 109571O (2019) https://doi.org/10.1117/12.2515183

KEYWORDS: Modeling and simulation, Calibration, Ultraviolet radiation, Extreme ultraviolet lithography, Stochastic processes, Data modeling, Line width roughness, Extreme ultraviolet, Scanning electron microscopy

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Proceedings Article | 10 October 2018 Paper

Paper

Improvement of CD stability and defectivity in resist coating and developing process in EUV lithography process

Yuya Kamei, Shinichiro Kawakami, Masahide Tadokoro, Yusaku Hashimoto, Takeshi Shimoaoki, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 10809, 1080924 (2018) https://doi.org/10.1117/12.2500896

KEYWORDS: Particles, Critical dimension metrology, Extreme ultraviolet lithography, Coating, Photoresist processing, Semiconducting wafers, Stochastic processes, Scanners, System on a chip, Extreme ultraviolet

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Proceedings Article | 27 March 2018 Presentation + Paper

Presentation + Paper

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Takahiro Shiozawa, Keisuke Yoshida, Masashi Enomoto, Kosuke Yoshihara, Hideo Nakashima, Serge Biesemans, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Hayakawa Makoto, Ryo Aizawa, Yoshitaka Konishi, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Masayuki Miyake, Tomoki Nagai, Satoshi Dei, Takehiko Naruoka, Motoyuki Shima, Toru Kimura, Geert Vandenberghe, John Petersen, Danilo De Simone, Foubert Philippe, Hans-Jürgen Stock, Balint Meliorisz, Akihiro Oshima, Seiichi Tagawa

Proceedings Volume 10586, 1058606 (2018) https://doi.org/10.1117/12.2297498

KEYWORDS: Ultraviolet radiation, Floods, Picosecond phenomena, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Chemically amplified resists, Polymers, Image enhancement, Absorption

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Proceedings Article | 27 March 2018 Presentation + Paper

Presentation + Paper

Constructing a robust PSCAR process for EUV

Michael Carcasi, Seiji Nagahara, Gosuke Shiraishi, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Kosuke Yoshihara, Masaru Tomono, Ryo Shimada, Kazuhiro Takeshita, Teruhiko Moriya, Yuya Kamei, Kathleen Nafus, Serge Biesemans, Hideo Nakashima, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Tomoki Nagai, Satoshi Dei, Masayuki Miyake, Takehiko Naruoka, Motoyuki Shima, Geert Vandenberghe, Danilo De Simone, Philippe Foubert, John Petersen, Akihiro Oshima, Seiichi Tagawa

Proceedings Volume 10583, 105831M (2018) https://doi.org/10.1117/12.2297370

KEYWORDS: Ultraviolet radiation, Extreme ultraviolet lithography, Extreme ultraviolet, Absorbance, Optical lithography, Absorption, Line edge roughness, Picosecond phenomena, Chemically amplified resists, Image processing

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Proceedings Article | 19 March 2018 Paper

Paper

Resist coating and developing process technology toward EUV manufacturing sub-7nm node

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Yusaku Hashimoto, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Marc Demand, Philippe Foubert

Proceedings Volume 10583, 105831V (2018) https://doi.org/10.1117/12.2297203

KEYWORDS: Semiconducting wafers, Particles, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photoresist processing, System on a chip, Coating, Yield improvement

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Proceedings Article | 16 October 2017 Paper

Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hiroshi Ichinomiya, Masashi Enomoto, Kathleen Nafus, Philippe Foubert

Proceedings Volume 10450, 104501F (2017) https://doi.org/10.1117/12.2280388

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Photoresist processing, Neodymium, Scanners, Coating, Line width roughness, Extreme ultraviolet, High volume manufacturing, Manufacturing

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Proceedings Article | 27 March 2017 Paper

Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Masashi Enomoto, Kathleen Nafus, Marc Demand, Philippe Foubert

Proceedings Volume 10143, 1014326 (2017) https://doi.org/10.1117/12.2257931

KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Coating, High volume manufacturing, Semiconducting wafers, Neodymium, Particles, System on a chip, Silicon

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Proceedings Article | 27 March 2017 Presentation + Paper

Presentation + Paper

Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Hisashi Nakagawa, Satoshi Dei, Takahiro Shiozawa, Kathleen Nafus, Danilo De Simone, Geert Vandenberghe, Hans-Jürgen Stock, Bernd Küchler, Masafumi Hori, Takehiko Naruoka, Tomoki Nagai, Yukie Minekawa, Tomohiro Iseki, Yoshihiro Kondo, Kosuke Yoshihara, Yuya Kamei, Masaru Tomono, Ryo Shimada, Serge Biesemans, Hideo Nakashima, Philippe Foubert, Elizabeth Buitrago, Michaela Vockenhuber, Yasin Ekinci, Akihiro Oshima, Seiichi Tagawa

Proceedings Volume 10146, 101460G (2017) https://doi.org/10.1117/12.2258217

KEYWORDS: Extreme ultraviolet lithography, Chemically amplified resists, Floods, Lithography, Extreme ultraviolet, Line edge roughness, Image processing, Image enhancement, Ultraviolet radiation, Scanners, Picosecond phenomena, Polymers, Line width roughness, Stochastic processes

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Showing 5 of 17 publications

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