Dr. Mark Ma
Engineer at Photronics Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Inspection, Cadmium, Photomasks, Reticles, Opacity, Argon, Detection and tracking algorithms, Defect detection, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 June 2013 Paper
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Etching, Quartz, Analytical research, Critical dimension metrology, Process control, Attenuators, Atomic force microscopy, Photomasks, Opacity, Image processing

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Photomasks, Lithography, SRAF, Quartz, Optical proximity correction, Etching, Critical dimension metrology, Manufacturing, Phase shifts, Lithographic illumination

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Photomasks, Ions, Inspection, Reticles, Raman spectroscopy, Crystals, Contamination, Chemical analysis, Fluorine, Lithography

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Photomasks, Reticles, Inspection, Lithography, Semiconducting wafers, Data modeling, Failure analysis, Statistical analysis, 193nm lithography, Crystals

Showing 5 of 15 publications
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