Dr. Zachary Adam Levinson
Sr. Application Engineer at Synopsys Inc
SPIE Involvement:
Author
Area of Expertise:
Microlithography , Aberration extraction
Publications (15)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Monte Carlo methods, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Light scattering, Reflectivity, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Monochromatic aberrations, Point spread functions, Mirrors, Computing systems, Wavefronts, Zernike polynomials, Extreme ultraviolet lithography, Geometrical optics, Code v, EUV optics

Proceedings Article | 9 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Principal component analysis, Detection and tracking algorithms, Imaging systems, Wavefronts, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 19 June 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Systems modeling, Data modeling, Lithography, Tolerancing, Binary data, Photomasks, Image transmission, Semiconductors, Reticles

Showing 5 of 15 publications
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