Prof. Zejun J. Ding Profile

Prof. Zejun J. Ding

at Univ of Science and Technology of China

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 29 May 2013 Paper

Monte Carlo study of the influence of electron beam focusing to SEM linewidth measurement

P. Zhang, S. Mao, Z. Zhang, Z. Ding

Proceedings Volume 8729, 87290K (2013) https://doi.org/10.1117/12.2015358

KEYWORDS: Monte Carlo methods, Electron beams, Scanning electron microscopy, Beam shaping, Silicon, Line scan image sensors, Scattering, Optical simulations, Solids, Image processing

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Proceedings Article | 29 May 2013 Paper

Monte Carlo simulation of realistic beam-sample interaction in SEM: application to evaluation of sharpness measurement methods

Z. Ruan, S. Mao, P. Zhang, H. Li, Z. Ding

Proceedings Volume 8729, 87290J (2013) https://doi.org/10.1117/12.2015357

KEYWORDS: Scanning electron microscopy, Monte Carlo methods, Fourier transforms, Monochromatic aberrations, Statistical modeling, Instrument modeling, Particles, Scattering, Device simulation, Image processing

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Proceedings Article | 29 May 2013 Paper

Monte Carlo simulation of x-ray photoemission electron microscopic image

Z. Zhang, T. Tang, S. Mao, Z. Ding

Proceedings Volume 8729, 87290L (2013) https://doi.org/10.1117/12.2016301

KEYWORDS: X-rays, Monte Carlo methods, Silver, X-ray imaging, Gold, Silicon, Scattering, Scanning electron microscopy, Image enhancement, Image processing

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Proceedings Article | 29 May 2013 Paper

Surface optical properties for copper based on surface Kramers-Kroning analysis

T. Tang, Z. Zhang, K. Tőkési, K. Goto, Z. Ding

Proceedings Volume 8729, 87290I (2013) https://doi.org/10.1117/12.2016266

KEYWORDS: Copper, Electrons, Dielectrics, Optical properties, Thin films, Lithium, Refractive index, Solids, Reflection, Algorithms

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SPIE Journal Paper | 1 July 2009

Sensitivity of scanning electron microscope width measurements to model assumptions

John Villarrubia, Zejun Ding

JM3, Vol. 8, Issue 03, 033003, (July 2009) https://doi.org/10.1117/12.10.1117/1.3190168

KEYWORDS: Monte Carlo methods, Scattering, Scanning electron microscopy, Silicon, Data modeling, Copper, Electron microscopes, Dielectrics, Model-based design, Binary data

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Proceedings Article | 23 March 2009 Paper

Sensitivity of SEM width measurements to model assumptions

J. Villarrubia, Z. J. Ding

Proceedings Volume 7272, 72720R (2009) https://doi.org/10.1117/12.814300

KEYWORDS: Scattering, Monte Carlo methods, Scanning electron microscopy, Silicon, Copper, Data modeling, Binary data, Dielectrics, Model-based design, Physics

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Showing 5 of 6 publications

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