Zhaohui Karen Huang
Project Manager at Intel Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Data modeling, Calibration, Scanning electron microscopy, Scatterometry, Time metrology, Optical proximity correction, Semiconducting wafers, Scatter measurement, Process modeling

Proceedings Article | 24 May 2004 Paper
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Oxides, Lithography, Metrology, Scanners, Scanning electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Wafer testing, Single crystal X-ray diffraction

Proceedings Article | 8 December 1995 Paper
Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Defect detection, Opacity, Databases, Manufacturing, Inspection, Transmittance, Photomasks, Optical proximity correction, Phase measurement, Phase shifts

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