In this work, vanadium oxide thin films were grown on glass slides by using reactive direct current (DC) magnetron
sputtering from a vanadium target in an Ar+O2 atmosphere. It was found that the surface morphology, electrical and
optical properties were strongly affected by the deposition temperature. X-ray diffraction (XRD) and scanning electron
microscopy (SEM) were used to characterize the structure and surface morphology of the samples. The structures of
these films showed amorphous nature according to the XRD patterns showing no sharp diffraction peak. Measurements
of SEM indicated the smooth surface of film deposited at low deposition temperature and rough surface at relatively high
deposition temperature. In addition, these surfaces showed no obvious crystalline morphologies, which supported the
XRD results. Electrical measurement indicated that the square resistances of films showed an exponential increase from
33 kΩ/square to 46 MΩ/square as the deposition temperature decreased from 320 to 160 °C, and that the square resistancetemperature
curves of films exhibited typical semiconducting behavior. The investigation of optical properties of films in
near-infrared range indicated that transmittance varied from about 95 % to 55 % when the deposition temperature
elevated. In the ultraviolet-visible range, optical transmission measurements revealed that films showed distinguished
transmission spectra when they were grown at different deposition temperatures. In the range of 300 to 400 nm, a
transmittance shoulder was observed in the spectra, and this shoulder enhanced when the deposition temperature
increased. On the other hand, a transmission enhancement at 530 nm disappeared after the deposition temperature
exceeded 240 °C.
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