Dr. Zheng G. Chen
Lithography engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Diffraction, Monochromatic aberrations, Reticles, Imaging systems, Error analysis, Finite element methods, Photomasks, Immersion lithography, Optical proximity correction, Semiconducting wafers

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Polishing, Scanners, Manufacturing, Resistance, Semiconductor manufacturing, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Bacteria

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Image processing, Atomic force microscopy, Photoresist materials, Photomasks, Optical proximity correction, Chemical reactions, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Oxides, Thin films, Lithography, Etching, Dielectrics, Silicon, Scanning electron microscopy, Photomasks, Reactive ion etching, Photoresist processing

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Semiconductors, Lithography, Lithographic illumination, Image processing, Printing, Distance measurement, Photomasks, Critical dimension metrology, Phase shifts, Back end of line

Showing 5 of 13 publications
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