Dr. Zheng Shi Profile

Dr. Zheng Shi

at Zhejiang Univ

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Author

Publications (11)

Proceedings Article | 1 April 2024 Paper

An efficient inverse lithography technology method based on detail-enhanced Pix2Pix network

Zuoxian Chen, Zheng Shi

Proceedings Volume 13081, 130810D (2024) https://doi.org/10.1117/12.3025959

KEYWORDS: Convolution, Lithography, Optical proximity correction, Education and training, Gallium nitride, Semiconducting wafers, Feature extraction, Performance modeling, Model based design, Source mask optimization

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Proceedings Article | 9 February 2024 Paper

SEC-RDMA: a scheme to enhance security for RDMA one-sided operations

Xinyi Chen, Zheng Shi, Liguo Qian

Proceedings Volume 13073, 130730G (2024) https://doi.org/10.1117/12.3026425

KEYWORDS: Network security, Defense and security

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Proceedings Article | 12 December 2018 Paper

An approach for sensing underwater particles using digital holographic imaging

Chao Liu, Xiaoping Wang, Yingtian Hu, Ming Tang, Zheng Shi

Proceedings Volume 10850, 108500S (2018) https://doi.org/10.1117/12.2505602

KEYWORDS: Particles, Digital holography, Holograms, Holography, Reconstruction algorithms, Ocean optics, Digital imaging, Diffraction, Wavefronts

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Proceedings Article | 18 September 2018 Paper

Novel feature extraction method for rapid analysis of water contaminants based on three-dimensional fluorescence and absorption spectroscopy

Yingtian Hu, Chao Liu, Zheng Shi, Xin Chen, Dongdong Zhao, Xiaoping Wang

Proceedings Volume 10768, 107680F (2018) https://doi.org/10.1117/12.2319929

KEYWORDS: Absorption spectroscopy, Feature extraction, Fluorescence spectroscopy, Spectroscopy

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Proceedings Article | 18 August 2018 Paper

Research on marine plankton imaging based on digital holographic technology

Chao Liu, Yingtian Hu, Ming Tang, Zheng Shi, Xiaoping Wang

Proceedings Volume 10749, 1074918 (2018) https://doi.org/10.1117/12.2320265

KEYWORDS: Digital holography, Ocean optics, Holograms, Digital image processing, Reconstruction algorithms

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Proceedings Article | 8 November 2012 Paper

Hotspot classification based on higher-order local autocorrelation

Bin Lin, Zheng Shi, Ye Chen

Proceedings Volume 8522, 85222O (2012) https://doi.org/10.1117/12.964384

KEYWORDS: Principal component analysis, Image classification, Binary data, Feature extraction, Vector spaces, Dimension reduction, Optical proximity correction, Photomasks, Semiconducting wafers, Wafer inspection

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Proceedings Article | 3 April 2010 Paper

A kernel-based DFM model for process from layout to wafer

Yiwei Yang, Zheng Shi, Litian Sun, Ye Chen, Zhijuan Hu

Proceedings Volume 7641, 76410O (2010) https://doi.org/10.1117/12.844671

KEYWORDS: Design for manufacturing, Finite element methods, Process modeling, Computer aided design, Manufacturing, Optimization (mathematics), Data modeling, Convolution, Personal protective equipment, Semiconducting wafers

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A layout design that passes the design rule check (DRC) may still have manufacturing problems today, especially around areas of critical patterns. Thus a design-for-manufacturability (DfM) model, which can simulate the process from designed layout to wafer and predict the final contours, is necessary. A new kind of DfM model called free-elementmodel (FEM) is proposed in this paper. The framework of FEM is borrowed from the forward process model, which is basically a set of convolution kernels in matrix form, yet the unknown variables are the kernel elements instead of process parameters. The modeling process is transformed into a non-linear optimization problem, with equality constraints which involve norm-2 regulation of kernels and inner production of any two kernels to keep the normalization and orthogonality of optimized kernels. Gradient-based method with Lagrange penalty function is explored to solve the optimization problem to minimize the difference between simulated contours and real contours. The dimension of kernels in FEM is determined by the cutoff frequency and the ambit. Since kernels are calculated by optimization method instead of decomposition of transmission cross coefficient (TCC), every element of kernels becomes a factor to describe the process. FEM is more flexible, and in it all effects that can be integrated into convolution kernels join naturally, such as the resist deviation and asymmetry of the process. No confidential process parameters, for example NA and defocus, appear in FEM explicitly, and thus the encapsulated FEM is suitable for IC manufacturers to publish. Moreover, enhancements and supplements to FEM are discussed in this paper, including the sufficiency of test patterns. In our experiments, DfM models for 2 process lines are generated based on test patterns, and the results show that the simulated shapes have an area error less than 2% compared to the real shapes of test patterns and an area error less than 3% compared to the shapes in typical blocks chosen from chip for verification purpose. The root mean square error of contour deviation between the 2 simulation results from FEM and conventional lithographic model is 10nm in a 65nm process.

Proceedings Article | 27 November 2007 Paper

Advances in OPC technology and development of ZOPC tool

Xiaolang Yan, Zheng Shi, Ye Chen, Qijun Chen

Proceedings Volume 6827, 68271U (2007) https://doi.org/10.1117/12.760169

KEYWORDS: Optical proximity correction, Process modeling, Lithography, Photomasks, Resolution enhancement technologies, Computer simulations, 3D modeling, Data modeling, Semiconducting wafers, Model-based design

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Proceedings Article | 12 May 2007 Paper

A specialized cell-wise OPC method for OPC-unfriendly spot detection

Ye Chen, Zheng Shi

Proceedings Volume 6607, 66070O (2007) https://doi.org/10.1117/12.728938

KEYWORDS: Optical proximity correction, Model-based design, Convolution, Manufacturing, Lithography, Resolution enhancement technologies, Optics manufacturing, Calibration, Semiconducting wafers, Bridges

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Proceedings Article | 27 March 2007 Paper

A feasible model-based OPC algorithm using Jacobian matrix of intensity distribution functions

Ye Chen, Kechih Wu, Zheng Shi, Xiaolang Yan

Proceedings Volume 6520, 65204C (2007) https://doi.org/10.1117/12.711763

KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Lithography, Optical lithography, Convolution, Semiconductors, Californium, Process modeling, Detection and tracking algorithms

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Proceedings Article | 21 March 2007 Paper

SOFT: smooth OPC fixing technique for ECO process

Hongbo Zhang, Zheng Shi

Proceedings Volume 6521, 65211H (2007) https://doi.org/10.1117/12.712878

KEYWORDS: Optical proximity correction, Image segmentation, Lithography, Manufacturing, Resolution enhancement technologies, Photomasks, Design for manufacturability, Process modeling, Model-based design, Design for manufacturing

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Showing 5 of 11 publications

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