Dr. zhi liu Profile

Dr. zhi liu

engineer at 1963

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Publications (5)

Proceedings Article | 27 March 2014 Paper

Anti-spacer double patterning

Michael Hyatt, Karen Huang, Anton DeVilliers, Mark Slezak, Zhi Liu

Proceedings Volume 9051, 905118 (2014) https://doi.org/10.1117/12.2045617

KEYWORDS: Double patterning technology, Line width roughness, Optical lithography, Photoresist processing, Coating, Semiconducting wafers, Etching, Lithography, Photoresist materials, Plasma

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Proceedings Article | 1 April 2009 Paper

High-Si content BARC for dual-BARC systems such as trilayer patterning

Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Zhi Liu, Shang-Ho Lin

Proceedings Volume 7273, 72733M (2009) https://doi.org/10.1117/12.814440

KEYWORDS: Photoresist materials, Etching, Optical lithography, Plasma etching, Lithography, Plasma, Silicon, Line width roughness, Scanning electron microscopy, Optical properties

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Proceedings Article | 23 April 2008 Paper

High refractive index materials design for the next generation ArF immersion lithography

Taiichi Furukawa, Takanori Kishida, Kyouyuu Yasuda, Tsutomu Shimokawa, Zhi Liu, Mark Slezak, Katsuhiko Hieda

Proceedings Volume 6924, 692412 (2008) https://doi.org/10.1117/12.771122

KEYWORDS: Transmittance, Contamination, Absorbance, Microfluidics, Immersion lithography, Refractive index, Water, Laser irradiation, Ultraviolet radiation, Transparency

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Proceedings Article | 23 March 2007 Paper

High-performance 193-nm photoresists based on fluorosulfonamide

Wenjie Li, Kuang-Jung Chen, Ranee Kwong, Margaret Lawson, Mahmoud Khojasteh, Irene Popova, P. Rao Varanasi, Tsutomu Shimokawa, Yoshikazu Yamaguchi, Shiro Kusumoto, Makoto Sugiura, Takanori Kawakami, Mark Slezak, Gary Dabbagh, Zhi Liu

Proceedings Volume 6519, 65190F (2007) https://doi.org/10.1117/12.712231

KEYWORDS: Polymers, Etching, Fluorine, Resistance, Lithography, Immersion lithography, 193nm lithography, Chemical species, Photoresist materials, Lithographic illumination

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Proceedings Article | 4 May 2005 Paper

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Pushkara Varanasi, Ranee Kwong, Mahmoud Khojasteh, Kaushal Patel, Kuang-Jung Chen, Wenjie Li, M. Lawson, Robert Allen, Ratnam Sooriyakumaran, P. Brock, Linda Sundberg, Mark Slezak, Gary Dabbagh, Z. Liu, Yukio Nishimura, Takashi Chiba, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599700

KEYWORDS: Polymers, 193nm lithography, Lithography, Etching, Photoresist materials, Fluorine, Immersion lithography, Modulation, Photomasks, Reactive ion etching

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