Mr. Zhidong Du Profile

Zhidong Du

at ASML

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 31 August 2017 Presentation + Paper

Scalable maskless patterning of nanostructures using high-speed scanning probe arrays

Chen Chen, Meghana Akella, Zhidong Du, Liang Pan

Proceedings Volume 10354, 103540E (2017) https://doi.org/10.1117/12.2273546

KEYWORDS: Optical lithography, Nanostructures, Semiconductors, Silicon, Manufacturing, Semiconductor manufacturing, Data storage, Medicine, Defense and security, Molecules

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Proceedings Article | 29 August 2017 Presentation + Paper

Optical temperature mapping around plasmonic structures using directional anisotropy in fluorescence

Chen Chen, Zhidong Du, Liang Pan

Proceedings Volume 10353, 103530P (2017) https://doi.org/10.1117/12.2273535

KEYWORDS: Plasmonics, Anisotropy, Thermometry, Charge-coupled devices, Luminescence, Sensors, Polarization, Nanoparticles, Thermography, Temperature metrology

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Proceedings Article | 25 August 2017 Presentation + Paper

Electrostatic microcolumns for surface plasmon enhanced electron beamlets

Zhidong Du, Chen Chen, Liang Pan

Proceedings Volume 10346, 1034608 (2017) https://doi.org/10.1117/12.2273492

KEYWORDS: Plasmonics, Electron beam lithography, Lithography, Photomasks, Electron beams, Lenses, Surface plasmons, Optical lithography, Photoresist materials, Semiconducting wafers

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Proceedings Article | 27 April 2017 Presentation

Progress on complementary patterning using plasmon-excited electron beamlets (Conference Presentation)

Zhidong Du, Chen Chen, Liang Pan

Proceedings Volume 10144, 101440K (2017) https://doi.org/10.1117/12.2258163

KEYWORDS: Optical lithography, Plasmonics, Surface plasmons, Maskless lithography, Lithography, Nanolithography, Lenses, Semiconducting wafers, Beam controllers

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Proceedings Article | 22 March 2016 Paper

Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography

Zhidong Du, Ye Wen, Luis Traverso, Anurup Datta, Chen Chen, Xianfan Xu, Liang Pan

Proceedings Volume 9777, 97771D (2016) https://doi.org/10.1117/12.2219218

KEYWORDS: Electron beam lithography, Lithography, Plasmonics, Photomasks, Electron beams, Maskless lithography, Semiconducting wafers, Lenses, Optical lithography, Photoresist materials, Electrodes, Tolerancing, Silica, Dielectrics, Chromium, 3D modeling, Reactive ion etching, Beam shaping

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SPIE Journal Paper | 18 December 2015 Open Access

Design of electrostatic microcolumn for nanoscale photoemission source in massively parallel electron-beam lithography

Ye Wen, Zhidong Du, Liang Pan

JM3, Vol. 14, Issue 04, 043508, (December 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043508

KEYWORDS: Electrodes, Lithography, Tolerancing, 3D modeling, Semiconducting wafers, Dielectrics, Electron beam lithography, Beam shaping, Manufacturing, Mechanical engineering

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Proceedings Article | 6 March 2014 Paper

Optothermal response of plasmonic nanofocusing lens under picosecond laser irradiation

Z. Du, C. Chen, L. Traverso, X. Xu, L. Pan, I.-H. Chao, A. Lavine

Proceedings Volume 8967, 896707 (2014) https://doi.org/10.1117/12.2042751

KEYWORDS: Plasmonics, Picosecond phenomena, Scanning tunneling microscopy, Laser irradiation, Near field optics, Chromium, Metals, Thermography, Electromagnetism, Thermal modeling

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Showing 5 of 7 publications

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