Cathy Wang
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Overlay metrology, Metrology, Etching, Data modeling, Model-based design, Measurement devices, Lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction gratings, Scanning electron microscopy, Diffraction, Etching, Target detection, Sensors, Metrology, Switching

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Pellicles, Reticles, Deep ultraviolet, Overlay metrology, Extreme ultraviolet, Scanners, Distortion, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers

Proceedings Article | 13 March 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Overlay metrology, Semiconducting wafers, Etching, Polarization, Metrology, Scanning electron microscopy, Physics, Signal processing, Monte Carlo methods, Semiconductor manufacturing

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Overlay metrology, Polarization, Semiconducting wafers, Defense systems, Process control, Wafer-level optics, Diffraction gratings, Solids, Metrology, Image quality, Target detection, Detection and tracking algorithms, Diffraction, Thin films

Showing 5 of 15 publications
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