Dr. Kaiyu Yang
at ASML
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 17 April 2014 Paper
Xiaofeng Liu, Rafael Howell, Stephen Hsu, Kaiyu Yang, Keith Gronlund, Frank Driessen, Hua-Yu Liu, Steven Hansen, Koen van Ingen Schenau, Thijs Hollink, Paul van Adrichem, Kars Troost, Jörg Zimmermann, Oliver Schumann, Christoph Hennerkes, Paul Gräupner
Proceedings Volume 9048, 90480Q (2014) https://doi.org/10.1117/12.2047584
KEYWORDS: Source mask optimization, Photomasks, Extreme ultraviolet, Scanners, Fiber optic illuminators, 3D modeling, Optimization (mathematics), Extreme ultraviolet lithography, Deep ultraviolet, Algorithm development

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