Mr. Kwang-Young Hu Profile

Kwang-Young Hu

at ASML Korea Co Ltd

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 20 March 2020 Paper

Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing

Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju, Kang-Min Lee, Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu, Paul Böcker, Dong-Hak Lee, In-Ho Joo, Kang-San Lee

Proceedings Volume 11325, 113252X (2020) https://doi.org/10.1117/12.2552028

KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing

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Proceedings Article | 26 March 2019 Paper

YieldStar uDBO overlay metrology in Samsung D1y DRAM volume production

Jang-Sun Kim, Jin-Moo Byun, Remco Lancee, Jong-Hyun Hwang, Hyeon-Jun Ha, Kwang-Young Hu, Se-Ra Jeon, Won-Jae Jang, Hyung-Sub Son, Vidar van der Meijden, Marc Noot, Bartosz Foltynski, Lukasz Macht, Grzegorz Grzela, Cedric Grouwstra

Proceedings Volume 10959, 109592M (2019) https://doi.org/10.1117/12.2514931

KEYWORDS: Overlay metrology, Metrology, Front end of line, Yield improvement, Control systems, Scatterometry

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Proceedings Article | 22 March 2016 Paper

Holistic, model-based optimization of edge leveling as an enabler for lithographic focus control: application to a memory use case

T. Hasan, Y.-S. Kang, Y.-J. Kim, S.-J. Park, S.-Y. Jang, K.-Y. Hu, E. J. Koop, P. C. Hinnen, M. M. A. Voncken

Proceedings Volume 9778, 97783G (2016) https://doi.org/10.1117/12.2219121

KEYWORDS: Semiconducting wafers, Scanners, Servomechanisms, Sensors, Optimization (mathematics), Lithography, Yield improvement, Model-based design, Control systems, Process control

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