Mr. Roderik van Es Profile

Roderik van Es

Director Product Marketing EUV at ASML Netherlands BV

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Author

Publications (13)

Proceedings Article | 10 April 2024 Presentation

0.33 NA EUV systems for high-volume manufacturing

Peter Klomp, Roderik van Es, Stuart Young, Christophe Smeets

Proceedings Volume PC12953, PC129530O (2024) https://doi.org/10.1117/12.3014165

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Sustainability, Semiconducting wafers, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

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Proceedings Article | 22 November 2023 Presentation

0.33 NA EUV systems for high volume manufacturing

Stuart Young, Pieter Gunter, Emiel Eussen, Christophe Smeets, Roderik van Es

Proceedings Volume PC12750, PC127500N (2023) https://doi.org/10.1117/12.2692698

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Proceedings Article | 28 April 2023 Presentation + Paper

0.33 NA EUV systems for high volume manufacturing

Christophe Smeets, Nico Benders, Frank Bornebroek, Joe Carbone, Roderik van Es, Arthur Minnaert, Guido Salmaso, Stuart Young

Proceedings Volume 12494, 1249406 (2023) https://doi.org/10.1117/12.2658046

KEYWORDS: Extreme ultraviolet, High volume manufacturing, Semiconducting wafers, Carbon, Wavefront errors, Wavefront aberrations, Semiconductors, Scanners

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Proceedings Article | 16 November 2022 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Guido Salmaso, Joe Carbone, Marcel Mastenbroek, Nico Benders, Roderik Van Es

Proceedings Volume PC12292, PC1229202 (2022) https://doi.org/10.1117/12.2644629

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

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Proceedings Article | 13 June 2022 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Guido Salmaso, Joe Carbone, Marcel Mastenbroek, Nico Benders, Roderik van Es, Roelof de Graaf

Proceedings Volume PC12051, PC1205103 (2022) https://doi.org/10.1117/12.2614220

KEYWORDS: Critical dimension metrology, Control systems, High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic

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Proceedings Article | 30 September 2021 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Roderik Van Es, Roelof De Graaf, Leon Levasier, Marcel Mastenbroek, Eric Verhoeven

Proceedings Volume 11854, 1185404 (2021) https://doi.org/10.1117/12.2600961

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic, Critical dimension metrology, Control systems

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Proceedings Article | 22 February 2021 Presentation

0.33 NA EUV systems for high-volume manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie Van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Klaus Hummler, Roderik Van Es

Proceedings Volume 11609, 1160908 (2021) https://doi.org/10.1117/12.2583992

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Stochastic processes, Scanners, Overlay metrology, Logic, Lithography, Critical dimension metrology

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Proceedings Article | 22 September 2020 Presentation

0.33 NA EUV systems for High Volume Manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Martijn Leenders, Roderik van Es

Proceedings Volume 11517, 1151703 (2020) https://doi.org/10.1117/12.2572356

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Logic devices, Manufacturing, Scanners, Lithography, Logic, Overlay metrology, Critical dimension metrology, Stochastic processes

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Proceedings Article | 19 March 2018 Presentation + Paper

EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

Roderik van Es, Mark van de Kerkhof, Arthur Minnaert, Geert Fisser, Jos de Klerk, Joost Smits, Roel Moors, Eric Verhoeven, Leon Levasier, Rudy Peeters, Marco Pieters, Hans Meiling

Proceedings Volume 10583, 105830H (2018) https://doi.org/10.1117/12.2299503

KEYWORDS: Scanners, Semiconducting wafers, Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Projection systems, Fiber optic illuminators, Reticles, Manufacturing

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Proceedings Article | 16 October 2017 Presentation + Paper

EUV lithography industrialization progress

Roderik van Es, Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters

Proceedings Volume 10450, 1045003 (2017) https://doi.org/10.1117/12.2281184

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Proceedings Article | 24 March 2017 Paper

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters, Roderik van Es, Jan-Willem Bosker, Alexander Zdravkov, Egbert Lenderink, Fabrizio Evangelista, Par Broman, Bartosz Bilski, Thorsten Last

Proceedings Volume 10143, 101430D (2017) https://doi.org/10.1117/12.2258025

KEYWORDS: Lithography, Scanners, Extreme ultraviolet lithography, Pellicles, Extreme ultraviolet, High volume manufacturing, Fiber optic illuminators, Reticles, Particles, Projection systems

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Proceedings Article | 18 March 2016 Paper

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Martijn van Noordenburg, Roderik van Es, Eric Verhoeven, Henk Meijer, Arthur Minnaert, Jan-Willem van der Horst, Hans Meiling, Joerg Mallmann, Christian Wagner, Judon Stoeldraijer, Geert Fisser, Jo Finders, Carmen Zoldesi, Uwe Stamm, Herman Boom, David Brandt, Daniel Brown, Igor Fomenkov, Michael Purvis

Proceedings Volume 9776, 97760A (2016) https://doi.org/10.1117/12.2220423

KEYWORDS: Extreme ultraviolet, Overlay metrology, Extreme ultraviolet lithography, Manufacturing, Pellicles, Logic devices, Semiconducting wafers, Reticles, Photomasks, Scanners, Fiber optic illuminators, Tin

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Proceedings Article | 13 March 2015 Paper

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Arthur W. Minnaert, Martijn van Noordenburg, Jörg Mallmann, Noreen Harned, Judon Stoeldraijer, Christian Wagner, Carmen Zoldesi, Eelco van Setten, Jo Finders, Koen de Peuter, Chris de Ruijter, Milos Popadic, Roger Huang, Martin Lin, Frank Chuang, Roderik van Es, Marcel Beckers, David Brandt, Nigel Farrar, Alex Schafgans, Daniel Brown, Herman Boom, Hans Meiling, Ron Kool

Proceedings Volume 9422, 94221P (2015) https://doi.org/10.1117/12.2085912

KEYWORDS: Semiconducting wafers, Pellicles, Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Imaging systems, Logic, Scanners, Manufacturing, Overlay metrology

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Showing 5 of 13 publications

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