Ms. Soo-Yeon Mo Profile

Soo-Yeon Mo

at Hanyang Univ

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Author

Publications (3)

SPIE Journal Paper | 9 June 2016

Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle

Ki-Ho Ko, Soo-Yeon Mo, In-Seon Kim, Hye-Keun Oh

JM3, Vol. 15, Issue 02, 023506, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023506

KEYWORDS: Pellicles, Photomasks, Optical proximity correction, Extreme ultraviolet, Optical lithography, Image transmission, Absorption, Nanoimprint lithography, Extreme ultraviolet lithography, Logic

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Proceedings Article | 18 March 2016 Paper

Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle

Ki-Ho Ko, Soo-Yeon Mo, In-Seon Kim, Hye-Keun Oh

Proceedings Volume 9776, 97760I (2016) https://doi.org/10.1117/12.2220155

KEYWORDS: Pellicles, Photomasks, Extreme ultraviolet, Optical proximity correction, Optical lithography, Extreme ultraviolet lithography, Absorption, Image transmission, Critical dimension metrology, Nanoimprint lithography

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Proceedings Article | 23 October 2015 Paper

Optical proximity correction for extreme ultra-violet mask with pellicle

Soo-Yeon Mo, In-Seon Kim, Hye-Keun Oh

Proceedings Volume 9635, 96351F (2015) https://doi.org/10.1117/12.2196975

KEYWORDS: Pellicles, Optical proximity correction, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Logic, Semiconducting wafers, Ultraviolet radiation, High volume manufacturing, Optical lithography, Nanoimprint lithography, Image transmission

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