Mr. Takeharu Motokawa Profile

Takeharu Motokawa

at KIOXIA Corp

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 26 October 2020 Presentation + Paper

Resist pattern inspection for defect reduction in sub-15 nm templates

Takeharu Motokawa, Machiko Suenaga, Kazuki Hagihara, Noriko Iida nee Sakurai, Ryu Komatsu, Hideaki Sakurai, Shingo Kanamitsu, Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 11518, 115180H (2020) https://doi.org/10.1117/12.2572389

KEYWORDS: Inspection, Defect inspection, Scanning electron microscopy, Double patterning technology, Nanoimprint lithography, High volume manufacturing, Electron microscopes, Scatterometry, Microscopes, Coherence imaging

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Proceedings Article | 29 January 2020 Paper

Template development for sub15nm nanoimprint lithography

Ryota Seki, Akihiko Ando, Takeharu Motokawa, Machiko Suenaga, Noriko Iida nee Sakurai, Ryu Komatsu, Masato Naka, Rikiya Taniguchi, Syuichi Taniguchi, Kazuki Hagihara, Masato Saito, Hideaki Sakurai, Ryoji Yoshikawa, Eiji Yamanaka, Shingo Kanamitsu

Proceedings Volume 11178, 111780S (2020) https://doi.org/10.1117/12.2567043

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Inspection, Scanning electron microscopy, Optical lithography, Etching, Lithography, Double patterning technology, Quartz

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Proceedings Article | 5 October 2016 Paper

High-performance fabrication process for 2xnm hole-NIL template production

Keisuke Yagawa, Machiko Suenaga, Takeharu Motokawa, Mana Tanabe, Akihiko Ando, Eiji Yamanaka, Keiko Morishita, Shingo Kanamitsu, Masato Saito, Masamitsu Itoh

Proceedings Volume 9985, 99852E (2016) https://doi.org/10.1117/12.2243575

KEYWORDS: Lithography, Nanoimprint lithography, Image quality, Etching, Photoresist processing, Optical lithography, Defect inspection, X-rays, Double patterning technology, Semiconducting wafers

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Proceedings Article | 10 May 2016 Paper

High resolution hole patterning with EB lithography for NIL template production

Mana Tanabe, Keisuke Yagawa, Takeharu Motokawa, Kazuki Hagihara, Machiko Suenaga, Masato Saito, Shingo Kanamitsu, Masamitsu Itoh

Proceedings Volume 9984, 99840T (2016) https://doi.org/10.1117/12.2242363

KEYWORDS: Nanoimprint lithography, Optical lithography, Lithography, Dry etching, Image processing, Photoresist processing, Etching, Scanning electron microscopy, Semiconducting wafers, Vestigial sideband modulation

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Proceedings Article | 1 April 2016 Paper

Improvement of sub-20nm pattern quality with dose modulation technique for NIL template production

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Shingo Kanamitsu, Takeharu Motokawa, Kazuki Hagihara, Yukiyasu Arisawa, Sachiko Kobayashi, Masato Saito, Masamitsu Ito

Proceedings Volume 9777, 97771I (2016) https://doi.org/10.1117/12.2218809

KEYWORDS: Nanoimprint lithography, Lithography, Photomasks, Backscatter, Photoresist processing, Beam shaping, Solids, Data conversion, Semiconductors

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Proceedings Article | 28 July 2014 Paper

High performance mask fabrication process for the next-generation mask production

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Yoshihito Kobayashi, Takeharu Motokawa, Kazuki Hagihara, Masato Saito, Masamitsu Itoh

Proceedings Volume 9256, 925608 (2014) https://doi.org/10.1117/12.2069651

KEYWORDS: Photomasks, Optical lithography, Mask making, Photoresist processing, Lithography, Scanning electron microscopy, Beam shaping, Vestigial sideband modulation, Error analysis, Double patterning technology

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Proceedings Article | 1 October 2013 Paper

Patterning of EUVL binary etched multilayer mask

Kosuke Takai, Takeharu Motokawa, Koji Murano, Takashi Kamo, Naoya Hayashi

Proceedings Volume 8880, 88802M (2013) https://doi.org/10.1117/12.2033258

KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Binary data, Ruthenium, Tantalum, Lithography, Optical lithography, Photoresist processing, Wafer-level optics

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Proceedings Article | 9 September 2013 Paper

Potential of mask production process for finer pattern fabrication

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Yoshihito Kobayashi, Takeharu Motokawa, Kazuki Hagihara, Masato Saito, Masamitsu Itoh

Proceedings Volume 8880, 88802N (2013) https://doi.org/10.1117/12.2033257

KEYWORDS: Photomasks, Vestigial sideband modulation, Extreme ultraviolet, Lithography, Nanoimprint lithography, Scanning electron microscopy, Extreme ultraviolet lithography, Image analysis, Optical design, Optical lithography

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Proceedings Article | 25 September 2010 Paper

High performance photomask technology with the advanced binary film

Koji Murano, Kosuke Takai, Kunihiro Ugajin, Machiko Suenaga, Takeharu Motokawa, Masato Saito, Tomotaka Higaki, Osamu Ikenaga, Hidehiro Watanabe

Proceedings Volume 7823, 78232W (2010) https://doi.org/10.1117/12.866015

KEYWORDS: Photomasks, Critical dimension metrology, Etching, Chromium, Lithography, Binary data, Photomask technology, Thin films, Photoresist processing, Inspection

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Showing 5 of 9 publications

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