TeHung Wu
Senior Manager at Siemens EDA
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Logic, Detection and tracking algorithms, Image segmentation, Photomasks, Source mask optimization, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Feature extraction, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Image processing, Resistance, Photomasks, Transistors, Integrated circuits, Semiconducting wafers, Integrated circuit design, Overlay metrology, Classification systems

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Lithography, Lithographic illumination, Data modeling, Calibration, Scanners, Projection systems, Photomasks, Optical proximity correction, Critical dimension metrology, Optical calibration

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Cadmium, Manufacturing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top