Dr. Yoann Blancquaert
at CEA-LETI
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Scanners, Critical dimension metrology, Overlay metrology

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Diffraction, Metrology, Fourier transforms, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Manufacturing, Computer programming, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness, Statistical modeling, Edge roughness

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Metrology, Scatterometry, Machine learning, Maskless lithography, Reflectance spectroscopy, Electron beam direct write lithography, Semiconducting wafers, Inverse optics, Channel projecting optics

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silicon, Scanning electron microscopy, Optical scanning, Line width roughness, Optical alignment, Semiconducting wafers, Prototyping, Overlay metrology

Showing 5 of 19 publications
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