Young Ki Kim
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Semiconducting wafers, Lithography, Critical dimension metrology, Diffraction, Scanners, Yield improvement, High volume manufacturing, Metrology, Wafer-level optics, Process control

Proceedings Article | 22 January 2018 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Current controlled current source, Calibration, Scanners, Reticles, Monochromatic aberrations, Software development, Semiconducting wafers

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Scanners, Diffraction, Metrology, Semiconducting wafers, Process control, Calibration, Reticles, Overlay metrology, Critical dimension metrology, Lithography

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Error analysis, High volume manufacturing, Semiconducting wafers, Metrology, Process control, Control systems, Scanners, Diffraction, Time metrology, Forward error correction, Lithography, Critical dimension metrology

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconducting wafers, Reticles, Critical dimension metrology, Scanners, Photomasks, Metrology, Laser processing, Laser scanners, 3D scanning, Laser metrology

Showing 5 of 10 publications
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