Dr. Vladimir Liberman Profile

Dr. Vladimir Liberman

Senior Staff at MIT Lincoln Lab

SPIE Involvement:

Author

Publications (48)

Proceedings Article | 20 August 2020 Presentation + Paper

Presentation + Paper

Reconfigurable all-dielectric metalens for diffraction-limited imaging

Mikhail Shalaginov, Sensong An, Yifei Zhang, Fan Yang, Peter Su, Vladimir Liberman, Jeffrey Chou, Christopher Roberts, Myungkoo Kang, Carlos Rios, Qingyang Du, Clayton Fowler, Anuradha Agarwal, Kathleen Richardson, Clara Rivero-Baleine, Hualiang Zhang, Juejun Hu, Tian Gu

Proceedings Volume 11461, 114610M (2020) https://doi.org/10.1117/12.2565267

KEYWORDS: Electron beam lithography, Refractive index, Switching, Etching, Image resolution, Active optics

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Proceedings Article | 12 September 2019 Presentation + Paper

Presentation + Paper

Designing nonvolatile integrated photonics with low-loss optical phase change materials

Yifei Zhang, Qihang Zhang, Jeffrey Chou, Junying Li, Christopher Roberts, Myungkoo Kang, Claudia Gonçalves, Richard Soref, Carlos Ríos, Mikhail Shalaginov, Kathleen Richardson, Tian Gu, Vladimir Liberman, Juejun Hu

Proceedings Volume 11081, 110811S (2019) https://doi.org/10.1117/12.2528993

KEYWORDS: Switches, Switching, Crystals, Photonic crystals, Attenuators, Integrated optics, Geometrical optics, Photonic crystal devices, Integrated photonics

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Proceedings Article | 9 September 2019 Presentation

Presentation

Time domain modeling of bi-anisotropic media and phase change materials with generalized dispersion (Conference Presentation)

Ludmila Prokopeva, Vladimir Liberman, Jeffrey Chou, Christopher Roberts, Mikhail Shalaginov, Yifei Zhang, Juejun Hu, Zhaxylyk Kudyshev, Alexander Kildishev

Proceedings Volume 11080, 1108006 (2019) https://doi.org/10.1117/12.2529097

KEYWORDS: Mathematical modeling, Homogenization, Graphene, Dispersion, Metals, Crystals, Photonics, Differential equations, Convolution, Rapid manufacturing

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Proceedings Article | 13 May 2019 Paper

Paper

Reshaping light: reconfigurable photonics enabled by broadband low-loss optical phase change materials

Yifei Zhang, Jeffrey Chou, Mikhail Shalaginov, Carlos Rios, Christopher Roberts, Paul Robinson, Bridget Bohlin, Qingyang Du, Qihang Zhang, Junying Li, Myungkoo Kang, Claudia Gonçalves, Kathleen Richardson, Tian Gu, Vladimir Liberman, Juejun Hu

Proceedings Volume 10982, 109820Q (2019) https://doi.org/10.1117/12.2513385

KEYWORDS: Defense and security, Mid-IR, Refractive index, Switches, Switching, Waveguides, Crystals, Scanning electron microscopy, Photonics, Optical switching

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Proceedings Article | 17 September 2018 Presentation

Presentation

Ultra-thin, reconfigurable meta-optics using optical phase change materials (Conference Presentation)

Mikhail Shalaginov, Yifei Zhang, Sensong An, Jeffrey Chou, Qingyang Du, Anupama Yadav, Myungkoo Kang, Cesar Blanco, Peter Su, Megan Driggers, Andrew Kirk, Erwan Baleine, Anuradha Agarwal, Clara Rivero-Baleine, Vladimir Liberman, Kathleen Richardson, Hualiang Zhang, Juejun Hu, Tian Gu

Proceedings Volume 10719, 1071911 (2018) https://doi.org/10.1117/12.2323580

KEYWORDS: Optical components, Photonic devices, Transparency, Optical properties, Crystals, Photonic crystals, Optical switching, Selenium, Photonic crystal devices, Tellurium

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Proceedings Article | 23 May 2018 Presentation

Presentation

Reconfigurable photonics enabled by optical phase change materials (Conference Presentation)

Yifei Zhang, Jeffrey Chou, Qihang Zhang, Junying Li, Huashan Li, Qingyang Du, Anupama Yadav, Myungkoo Kang, Cesar Blanco, Huikai Zhong, Mikhail Shalaginov, Jeffrey Grossman, Richard Soref, Vladimir Liberman, Kathleen Richardson, Juejun Hu, Tian Gu

Proceedings Volume 10686, 1068606 (2018) https://doi.org/10.1117/12.2314894

KEYWORDS: Photonic devices, Optical properties, Crystals, Dielectrics, Photonic crystals, Photonics, Optical switching, Selenium, Photonic crystal devices, Tellurium

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Proceedings Article | 14 March 2018 Presentation

Presentation

Broadband low-loss optical phase change materials and devices (Conference Presentation)

Yifei Zhang, Jeffery Chou, Junying Li, Qingyang Du, Qihang Zhang, Huikai Zhong, Anupama Yadav, Myungkoo Kang, Zhuoran Fang, Hanyu Zheng, Mikhail Shalaginov, Tian Gu, Kathleen Richardson, Vladimir Liberman, Juejun Hu

Proceedings Volume 10541, 105410H (2018) https://doi.org/10.1117/12.2297139

KEYWORDS: Optical components, Refractive index, Switches, Optical properties, Dielectrics, Chalcogenides, Photonics systems, Optical switching, Solid state electronics

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Proceedings Article | 26 October 2017 Paper

Paper

Solar metadevice with enhanced absorption, scattering, and spectral control

R. Osgood, Y. Ait-El-Aoud, S. Giardini, N. LeGrand, M. Okamoto, A. Luce, V. Liberman, L. Parameswaran, R. Kingsborough, M. Rothschild, S. Kooi

Proceedings Volume 10343, 103430Z (2017) https://doi.org/10.1117/12.2273748

KEYWORDS: Amorphous silicon, Thin films, Nanostructures, Polymethylmethacrylate, Scattering, Glasses, Solar cells, Reflectivity, Aluminum, Absorption

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Proceedings Article | 22 April 2016 Presentation + Paper

Presentation + Paper

Fundamental limits of super-resolution microscopy by dielectric microspheres and microfibers

V. Astratov, A. Maslov, K. Allen, N. Farahi, Y. Li, A. Brettin, N. Limberopoulos, D. Walker, A. Urbas, V. Liberman, M. Rothschild

Proceedings Volume 9721, 97210K (2016) https://doi.org/10.1117/12.2212762

KEYWORDS: Gold, Confocal microscopy, Diffraction, Super resolution, Optical spheres, Microscopy, Dielectrics, Image resolution, Near field, Super resolution microscopy, Nanoplasmonics, Contact lenses, Neodymium, Imaging arrays, Specialty optical fibers, Near field optics, Photonic nanostructures

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Proceedings Article | 5 October 2015 Presentation

Presentation

Tunable VO2/Au hyperbolic metamaterial (Presentation Recording)

Srujana Prayakarao, Brock Mendoza, Andrew Devine, Chan Kyaw, Robert Van Dover, Mikhail Noginov, Vladimir Liberman

Proceedings Volume 9544, 95440V (2015) https://doi.org/10.1117/12.2190370

KEYWORDS: Semiconductors, Gold, Oxides, Vanadium, Metamaterials, Video, Transition metals, Transmittance, Temperature metrology, Absorption

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Proceedings Article | 7 October 2014 Paper

Paper

Scattering of long wavelengths into thin silicon photovoltaic films by plasmonic silver nanoparticles

R. Osgood, K. Bullion, S. Giardini, J. Carlson, P. Stenhouse, R. Kingsborough, V. Liberman, L. Parameswaran, M. Rothschild, O. Miller, S. Kooi, J. Joannopoulos, F. Jeffrey, S. Braymen, H. Singh Gill, J. Kumar

Proceedings Volume 9178, 91780I (2014) https://doi.org/10.1117/12.2062268

KEYWORDS: Thin films, Scattering, Nanoparticles, Polymers, Particles, Silver, Light scattering, Laser scattering, Silicon films, Antimony

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Proceedings Article | 24 June 2014 Paper

Paper

Fast, electrically tunable filters for hyperspectral imaging

V. Liberman, L. Parameswaran, C. Gear, A. Cabral, M. Rothschild

Proceedings Volume 9070, 90702B (2014) https://doi.org/10.1117/12.2057511

KEYWORDS: Plasmonics, Refractive index, Switching, Electrodes, Metals, Reflectivity, Liquid crystals, Antennas, Tunable filters, Anisotropy

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Proceedings Article | 4 March 2010 Paper

Paper

High fluence testing of optical materials for 193-nm lithography extensions applications

V. Liberman, S. Palmacci, G. Geurtsen, M. Rothschild, P. Zimmerman

Proceedings Volume 7640, 76402Z (2010) https://doi.org/10.1117/12.853094

KEYWORDS: Lithography, Silica, Birefringence, Spectroscopy, Luminescence, Laser induced fluorescence, Laser irradiation, Absorbance, Thin film coatings, Absorption

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Proceedings Article | 16 March 2009 Paper

Paper

High index 193 nm immersion lithography: the beginning or the end of the road

Paul Zimmerman, Bryan Rice, Emil Piscani, Vladimir Liberman

Proceedings Volume 7274, 727420 (2009) https://doi.org/10.1117/12.814381

KEYWORDS: Lithography, Refractive index, Prisms, Nanoparticles, Water, Crystals, Absorbance, Double patterning technology, Immersion lithography, Absorption

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Proceedings Article | 15 April 2008 Paper

Paper

Development and evaluation of 193nm immersion generation-three fluid candidates

Paul Zimmerman, Jeffrey Byers, Bryan Rice, Christopher Ober, Emmanuel Giannelis, Robert Rodriguez, Dongyan Wang, Naphtali O’Connor, Xuegong Lei, Nicholas Turro, Vladimir Liberman, Stephen Palmacci, Mordechai Rothschild, Neal Lafferty, Bruce Smith

Proceedings Volume 6923, 69230A (2008) https://doi.org/10.1117/12.772887

KEYWORDS: Oxides, Refractive index, Transparency, Nanoparticles, Metals, Water, Ultraviolet radiation, Absorbance, Nanocomposites, Polarizability

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Proceedings Article | 27 March 2007 Paper

Paper

Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects

V. Liberman, M. Rothschild, S. Palmacci, P. Zimmerman, A. Grenville

Proceedings Volume 6520, 652035 (2007) https://doi.org/10.1117/12.723958

KEYWORDS: Metrology, Microfluidics, Contamination, Water, Oxygen, Microfluidic imaging, Absorbance, Immersion lithography, Chemical elements, Photochemistry

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Proceedings Article | 26 March 2007 Paper

Paper

High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches

R. French, V. Liberman, H. Tran, J. Feldman, D. Adelman, R. Wheland, W. Qiu, S. McLain, O. Nagao, M. Kaku, M. Mocella, M. Yang, M. Lemon, L. Brubaker, A. Shoe, B. Fones, B. Fischel, K. Krohn, D. Hardy, C. Chen

Proceedings Volume 6520, 65201O (2007) https://doi.org/10.1117/12.712234

KEYWORDS: Computational fluid dynamics, Refractive index, Microfluidics, Contamination, Diffractive optical elements, Water, Scanners, Absorbance, Immersion lithography, Absorption

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SPIE Journal Paper | 1 January 2007

Impact of photoacid generator leaching on optics photocontamination in 193-nm immersion lithography

Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, Andrew Grenville

JM3, Vol. 6, Issue 01, 013001, (January 2007) https://doi.org/10.1117/12.10.1117/1.2712841

KEYWORDS: Contamination, Immersion lithography, Laser irradiation, Wafer-level optics, Optical components, Semiconducting wafers, Liquids, Diffusion, In situ metrology, Reflection

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Proceedings Article | 15 March 2006 Paper

Paper

Studies of consequences of photo-acid generator leaching in 193nm immersion lithography

V. Liberman, M. Switkes, M. Rothschild, S. Palmacci, A. Grenville

Proceedings Volume 6154, 615416 (2006) https://doi.org/10.1117/12.659596

KEYWORDS: Wafer-level optics, Optical components, Lithography, Contamination, Capillaries, Particles, Silicon, Laser irradiation, Immersion lithography, Semiconducting wafers

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Proceedings Article | 12 May 2005 Paper

Paper

Long-term 193-nm laser irradiation of thin-film-coated CaF2 in the presence of H2O

V. Liberman, M. Switkes, M. Rothschild, S. Palmacci, J. Sedlacek, D. Hardy, A. Grenville

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601468

KEYWORDS: Thin films, Ellipsometry, Lithography, Metrology, Birefringence, Ultraviolet radiation, Optical coatings, Laser irradiation, Spectroscopic ellipsometry, Thin film coatings

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Proceedings Article | 12 May 2005 Paper

Paper

Controlled contamination studies in 193-nm immersion lithography

V. Liberman, S. Palmacci, D. Hardy, M. Rothschild, A. Grenville

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601473

KEYWORDS: Lithography, Metrology, Contamination, Silica, Ultraviolet radiation, Silicon, Immersion lithography, Liquids, Absorption, Oxidation

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SPIE Journal Paper | 1 January 2005

Nanocomposite approaches toward pellicles for 157-nm lithography

Vladimir Liberman, Jan Sedlacek, Theodore Fedynyshyn, Russell Goodman, Mordechai Rothschild, Roger Sinta

JM3, Vol. 4, Issue 01, 013004, (January 2005) https://doi.org/10.1117/12.10.1117/1.1858131

KEYWORDS: Nanoparticles, Polymers, Pellicles, Absorbance, Polymer thin films, Nanocomposites, Particles, Transparency, Lithography, Silica

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Proceedings Article | 28 May 2004 Paper

Paper

Photo-induced changes in 157-nm optical coatings

Vladimir Liberman, Theodore Bloomstein, Mordechai Rothschild, Stephen Palmacci, Jan Sedlacek, Andrew Grenville

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534190

KEYWORDS: Thin films, Ellipsometry, Data modeling, X-rays, Optical coatings, Surface roughness, Atomic force microscopy, Spectroscopic ellipsometry, Thin film coatings, Fluorine

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Proceedings Article | 26 June 2003 Paper

Paper

Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation

Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, Nikolay Efremow, Jan Sedlacek, Andrew Grenville

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485470

KEYWORDS: Lithography, Antireflective coatings, Glasses, Laser induced damage, Calcium, Coating, Beam delivery, Laser irradiation, Laser optics, Pulsed laser operation

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Proceedings Article | 26 June 2003 Paper

Paper

Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists

Theodore Bloomstein, Jan Sedlacek, Stephen Palmacci, Dennis Hardy, Vladimir Liberman, Mordechai Rothschild

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485468

KEYWORDS: Antireflective coatings, Contamination, Sulfur, Diffusion, Oxygen, Photoresist materials, Iodine, Absorbance, Pulsed laser operation, Liquids

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Proceedings Article | 26 June 2003 Paper

Paper

Ambient effects on the laser durability of 157-nm optical coatings

Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, Nikolay Efremow, Jan Sedlacek, Andrew Grenville

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.497525

KEYWORDS: Thin films, Antireflective coatings, Contamination, Sensors, Optical coatings, Oxygen, Laser irradiation, Thin film coatings, Fluorine, Absorption

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SPIE Journal Paper | 1 January 2003

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Nikolay Efremow, Stephen Palmacci, Jan Sedlacek, Andrew Grenville, Kevin Orvek

JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1528948

KEYWORDS: Pellicles, Absorption, Sensors, Lithography, Contamination, Laser irradiation, Oxygen, Antireflective coatings, Lamps, Thin film coatings

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Proceedings Article | 30 July 2002 Paper

Paper

Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities

Theodore Bloomstein, Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, D. Hardy, Jan Sedlacek

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474620

KEYWORDS: Thin films, Antireflective coatings, Contamination, Silica, Coating, Bioalcohols, Oxygen, Fluorine, Pulsed laser operation, Absorption

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Proceedings Article | 30 July 2002 Paper

Paper

Long-term laser durability testing of optical coatings and thin films for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, N. Efremow, Jan Sedlacek, A. Grenville

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474552

KEYWORDS: Optical components, Thin films, Lithography, Antireflective coatings, Contamination, Spectroscopy, Lamps, Optical coatings, Optical testing, Thin film coatings

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Proceedings Article | 30 July 2002 Paper

Paper

Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Andrew Grenville, Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Roger French, Robert Wheland, Xun Zhang, Joe Gordan

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474604

KEYWORDS: Reticles, Polymers, Lamps, Oxygen, Laser irradiation, Pellicles, Absorbance, Semiconducting wafers, Polymer thin films, Absorption

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Proceedings Article | 30 July 2002 Paper

Paper

Attenuating phase-shifting mask at 157 nm

Vladimir Liberman, Mordechai Rothschild, Steven Spector, Keith Krohn, Susan Cann, Stefan Hien

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474603

KEYWORDS: Lithography, Phase shifting, Etching, Metals, Glasses, Platinum, Laser irradiation, Photomasks, Binary data, Phase shifts

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Proceedings Article | 30 July 2002 Paper

Paper

157-nm pellicles: polymer design for transparency and lifetime

Roger French, Robert Wheland, Weiming Qiu, M. Lemon, Gregory Blackman, Xun Zhang, Joe Gordon, Vladimir Liberman, A. Grenville, Roderick Kunz, Mordechai Rothschild

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474605

KEYWORDS: Lithography, Transparency, Optical lithography, Polymers, Quantum efficiency, Pellicles, Absorbance, Molecular lasers, Vacuum ultraviolet, Absorption

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The introduction of 157 nm as the next optical lithography wavelength has created a need for new soft (polymeric) or hard (quartz) pellicle materials. Pellicles should be > 98% transparent to incident 157 nm light and, ideally, sufficiently resistant to photochemical damage to remain useful for an exposure lifetime of 7.5 kJ/cm2. The transparency specification has been met. We have developed families of experimental Teflon™AF (TAFx) polymers with > 98% transparency which can be spin coated and lifted as micron-scale, unsupported membranes. Still higher transparencies should be possible once optimization of intrinsic (composition, end groups, impurities, molecular weight) and extrinsic (oxygen, absorbed hydrocarbons, contaminants) factors are completed. The measured transparencies of actual pellicle films, however, are affected by many factors other than absorption. Film thickness must be precisely controlled so as to allow operation at the fringe maxima for the lithographic wavelength. Roughness and thickness uniformity are also critical. An important part of our program has thus been learning how to spin membranes from the solvents that dissolve our pellicle candidates. Meeting the durability specification at 157 nm remains a major concern. The 157 nm radiation durability lifetime of a polymer is determined by two fundamental properties: the fraction of 157 nm radiation absorbed and the fraction (quantum efficiency) of this absorbed radiation that results in photochemical darkening. Originally it was assumed that lifetime increases uniformly with increasing transparency. We now have cases where materials with very different absorbances (TAFx4P and 46P) have similar lifetimes and materials with similar absorptions (TAFx46P and 2P) have very different lifetimes. These findings demonstrate the importance of the relative quantum efficiencies as the 157 nm light energy distributes itself along degradative versus non-degradative pathways. In an effort to identify chemical and structural features that control lifetime, we have been studying model molecular materials, some quite similar to the monomer units used to make our pellicle candidates. Several of these models have shown transparencies much higher and lifetimes far longer than our best pellicle candidates to date.

Proceedings Article | 9 April 2002 Paper

Paper

Damage testing of partial reflectors for 157-nm laser calorimeters

Holger Laabs, Richard Jones, Christopher Cromer, Marla Dowell, Vladimir Liberman

Proceedings Volume 4679, (2002) https://doi.org/10.1117/12.461726

KEYWORDS: Calibration, Copper, Nickel, Reflectivity, Chemical vapor deposition, Sapphire, Excimer lasers, Laser damage threshold, Silicon carbide, Pulsed laser operation

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Proceedings Article | 14 September 2001 Paper

Paper

Controlled contamination of optics under 157-nm laser irradiation

Theodore Bloomstein, Vladimir Liberman, Stephen Palmacci, Mordechai Rothschild

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435766

KEYWORDS: Optical components, Antireflective coatings, Contamination, Nitrogen, Coating, Oxygen, Laser irradiation, Projection systems, Laser optics, Ranging

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Proceedings Article | 14 September 2001 Paper

Paper

UV cleaning of contaminated 157-nm reticles

Theodore Bloomstein, Vladimir Liberman, Mordechai Rothschild, N. Efremow, D. Hardy, Stephen Palmacci

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435764

KEYWORDS: Reticles, Silica, Spectroscopy, Ultraviolet radiation, Lamps, Reflectivity, Surface roughness, Chromium, Oxygen, Pellicles

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Proceedings Article | 14 September 2001 Paper

Paper

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, N. Efremow, Stephen Palmacci, Jan Sedlacek, Chris Van Peski, Kevin Orvek

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435759

KEYWORDS: Lithography, Spectroscopy, Lamps, Optical coatings, Oxygen, Laser irradiation, Pellicles, Chlorine, Thin film coatings, Absorption

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Proceedings Article | 24 August 2001 Paper

Paper

Experimental VUV absorbance study of fluorine-functionalized polystyrenes

Roderick Kunz, Roger Sinta, Michael Sworin, William Mowers, Theodore Fedynyshyn, Vladimir Liberman, Jane Curtin

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436858

KEYWORDS: Lithography, Transparency, Oscillators, Contamination, Polymers, Reflectivity, Absorbance, Analog electronics, Vacuum ultraviolet, Absorption

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Proceedings Article | 5 July 2000 Paper

Paper

Laser cleaning of optical elements in 157-nm lithography

Theodore Bloomstein, Mordechai Rothschild, Vladimir Liberman, D. Hardy, N. Efremow, Stephen Palmacci

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388993

KEYWORDS: Optical components, Thin films, Lithography, Polymethylmethacrylate, Polymers, Nitrogen, Oxygen, Vacuum ultraviolet, Polymer thin films, Absorption

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Proceedings Article | 5 July 2000 Paper

Paper

Long-term testing of optical components for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Kevin Orvek

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389037

KEYWORDS: Optical components, Reflectors, Lithography, Silica, Sensors, Dielectrics, Calcium, Reflectivity, Optical testing, Absorption

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Proceedings Article | 5 July 2000 Paper

Paper

Experimentation and modeling of organic photocontamination on lithographic optics

Roderick Kunz, Vladimir Liberman, Deanna Downs

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389036

KEYWORDS: Lithography, Contamination, Quantum efficiency, Nitrogen, Chemical vapor deposition, Adsorption, Ozone, Natural surfaces, Autoregressive models, Absorption

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Proceedings Article | 2 June 2000 Paper

Paper

Determination of optical properties of thin films and surfaces in 157-nm lithography

Vladimir Liberman, Theodore Bloomstein, Mordechai Rothschild

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386457

KEYWORDS: Thin films, Lithography, Data modeling, Optical properties, Reflection, Dielectrics, Silicon, Silicon films, Vacuum ultraviolet, Absorption

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Proceedings Article | 26 July 1999 Paper

Paper

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Chris Van Peski

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354323

KEYWORDS: Optical components, Lithography, Beam splitters, Silica, Birefringence, Calcium, Laser applications, Ozone, Pulsed laser operation, Absorption

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Proceedings Article | 25 June 1999 Paper

Paper

Optical materials and coatings at 157 nm

Theodore Bloomstein, Vladimir Liberman, Mordechai Rothschild, D. Hardy, Russell Goodman

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351106

KEYWORDS: Optical components, Thin films, Contamination, Magnesium fluoride, Silica, Spectroscopy, Optical coatings, Pellicles, Photomasks, Absorption

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Proceedings Article | 7 April 1999 Paper

Paper

Marathon testing of optical materials for 193-nm lithographic applications

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Chris Van Peski

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344432

KEYWORDS: Lithography, Silica, Calcium, Optical coatings, Reflectivity, Surface roughness, Transmittance, Pulsed laser operation, Surface finishing, Absorption

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Proceedings Article | 27 October 1998 Paper

Paper

Testing of optical materials for 193-nm applications

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3427, (1998) https://doi.org/10.1117/12.328512

KEYWORDS: Lithography, Antireflective coatings, Beam splitters, Silica, Birefringence, Calcium, Optical coatings, Reflectivity, Pulsed laser operation, Absorption

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Proceedings Article | 29 June 1998 Paper

Paper

Damage testing of pellicles for 193-nm lithography

Vladimir Liberman, Roderick Kunz, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310776

KEYWORDS: Lithography, Refractive index, Reticles, Polymers, Spectroscopy, Nitrogen, Surface roughness, Pellicles, Ozone, Absorption

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Proceedings Article | 29 June 1998 Paper

Paper

Assessment of optical coatings for 193-nm lithography

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310775

KEYWORDS: Lithography, Antireflective coatings, Dielectrics, Nitrogen, Optical coatings, Reflectivity, Interferometry, Excimer lasers, Calorimetry, Absorption

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Proceedings Article | 12 February 1997 Paper

Paper

Marathon damage testing of pellicles for 193-nm lithography

Andrew Grenville, Vladimir Liberman, Roderick Kunz, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301218

KEYWORDS: Lithography, Refractive index, Reticles, Optical properties, Polymers, Nitrogen, Pellicles, Radiation effects, Ozone, Absorption

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Showing 5 of 48 publications

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