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13 June 2022 Infiltration synthesis: paving way for uniquely functional hybrids and direct-writing optoelectronic nanostructures
Nikhil M. Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Aaron Stein, Chang-Yong Nam
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Proceedings Volume PC12054, Novel Patterning Technologies 2022; PC120540G (2022) https://doi.org/10.1117/12.2618064
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
Abstract
Infiltration synthesis is an emerging material hybridization technique. Starting with a brief dive into infiltration synthesis mechanism, I will present our pioneering work on ex-situ conversion of conventional organic photoresists into hybrid EUV resists as well as the generation of mechanically resilient hybrids with one of the highest storage elastic strain energy capacities for potential applications in MEMS technologies. I will also overview the use of infiltration synthesis approach for hybridizing nanopatterned polymer templates and self-assembled block copolymer thin films to form robust dry etch masks for pattern transfer as well as direct-writing oxide nanostructures for optoelectronic device applications.
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Nikhil M. Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Aaron Stein, and Chang-Yong Nam "Infiltration synthesis: paving way for uniquely functional hybrids and direct-writing optoelectronic nanostructures", Proc. SPIE PC12054, Novel Patterning Technologies 2022, PC120540G (13 June 2022); https://doi.org/10.1117/12.2618064
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KEYWORDS
Nanostructures
Optoelectronics
Microelectromechanical systems
Optoelectronic devices
Oxides
Photoresist materials
Polymer thin films
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