Practical Process Applications Of A Commercially Available Electrical Overlay And Linewidth Measuring System

Gerald A. Keller

doi:10.1117/12.947762

23 July 1985 Practical Process Applications Of A Commercially Available Electrical Overlay And Linewidth Measuring System

Gerald A. Keller

Author Affiliations +

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947762
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

This paper deals with characterization of a pilot line photo process using an electrical linewidth measurement system.* A functional process for set up of the system is described, as well as the test structures used. Evaluations conducted include overlay stability of a Perkin-Elmer 542 and adjustment, overlay of a Perkin-Elmer 542 to three Perkin-Elmer 240s, overlay to a Perkin-Elmer 542 in another wafer fab, a daily linewidth evaluation on a Perkin-Elmer 542, and a comparison study of the electrical prober to other types of linewidth measuring systems. It will be shown that this tool, with precision in the .001 pm range (3 Q) is capable of providing correlation data for other types of quick feedback, smaller data base systems for linewidth measurement, as well as providing a data base for the proper evaluation of photolithographic processing.

Citation Download Citation

Gerald A. Keller "Practical Process Applications Of A Commercially Available Electrical Overlay And Linewidth Measuring System", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947762

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