Development Of Double Twin Path Laser Interferometer For Thin Film Thickness Measurement

Yoshiyuki Uchida; Motomu Asano; Masatoshi Kuwata; Masaaki Yamaguchi; Kazuhiro Hane; Shuzo Hattori

doi:10.1117/12.938598

25 November 1986 Development Of Double Twin Path Laser Interferometer For Thin Film Thickness Measurement

Yoshiyuki Uchida, Motomu Asano, Masatoshi Kuwata, Masaaki Yamaguchi, Kazuhiro Hane, Shuzo Hattori

Proceedings Volume 0661, Optical Testing and Metrology; (1986) https://doi.org/10.1117/12.938598
Event: 1986 Quebec Symposium, 1986, Quebec City, Canada

Abstract

We describe a novel laser interferometer which measure thin film thickness automatically with simultaneous reference level control. The system use a He-Ne laser as light source and a grating as beam splitter-recombiner. The 0 and -1 order beam diffracted by the grating are reflected at the substrate and the +1 order beam is reflected at the film. These beams again pass through the grating and diffracted to interfere. The interference between the diffracted components of 0 and -1 order beam is used to control the reference level, and the interference between the diffracted components of 0 and +1 order beam is used to measure the film thickness. Rising in the two pairs of twin path we call this interferometer as a double twin path laser interferometer. Theoretical estimations give the high accuracy of better than ±0.1 nm. A mechanically stable and compact system has been constructed. The experimental results show that the performance of system is fairly satisfactory. Alminium films of thickness ranging from 70 nm to 300 nm were measured with a accuracy of ±20 nm. Additionally we discuss the problems in the first trial construction and how to improve the accuracy and stability in this system. The second trial construction including the improvements is attempted.

Citation Download Citation

Yoshiyuki Uchida, Motomu Asano, Masatoshi Kuwata, Masaaki Yamaguchi, Kazuhiro Hane, and Shuzo Hattori "Development Of Double Twin Path Laser Interferometer For Thin Film Thickness Measurement", Proc. SPIE 0661, Optical Testing and Metrology, (25 November 1986); https://doi.org/10.1117/12.938598

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Ferroelectric materials

Signal processing

Amplifiers

Photodetectors

Interferometers

Mirrors

Modulation

Show All Keywords

Keywords/Phrases

Search In:

Publication Years